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plasma
Japan

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Employment (1)

National Institute of Advanced Industrial Science and Technology: Saga, JP

Employment
Source: Self-asserted source
Taisei Motomura

Works (32)

Effect of Si addition on polarity inversion in scandium aluminum nitride piezoelectric thin films

Scripta Materialia
2025-03 | Journal article
Contributors: Sri Ayu Anggraini; Masato Uehara; Kenji Hirata; Taisei Motomura; Hiroshi Yamada; Morito Akiyama
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Crossref

Effect of plasma discharge pulse length for GaN film crystallinity on sapphire substrate by high density convergent plasma sputtering device

Journal of Vacuum Science & Technology A
2024-09-01 | Journal article
Contributors: Itsuki Misono; Taisei Motomura; Tatsuo Tabaru; Masato Uehara; Tetsuya Okuyama
Source: check_circle
Crossref

Ultra-High Vacuum Cells Realized by Miniature Ion Pump Using High-Efficiency Plasma Source

Sensors
2024-06-20 | Journal article
Contributors: Yuichi Kurashima; Atsuhiko Maeda; Naoto Oshima; Taisei Motomura; Takashi Matsumae; Mitsuhiro Watanabe; Hideki Takagi
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Crossref
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Suppression of substrate temperature in DC magnetron sputtering deposition by magnetic mirror-type magnetron cathode

AIP Advances
2023-02-01 | Journal article
Contributors: Taisei Motomura; Kenshin Takemura; Toshimi Nagase; Nobutomo Morita; Tatsuo Tabaru
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Crossref

High-Efficiency Plasma Source Using a Magnetic Mirror Trap for Miniature-Ion Pumps

Sensors
2023-01-16 | Journal article
Contributors: Yuichi Kurashima; Taisei Motomura; Shinya Yanagimachi; Takashi Matsumae; Mitsuhiro Watanabe; Hideki Takagi
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Crossref
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Substrate temperature dependence of GaN film deposited on sapphire substrate by high-density convergent plasma sputtering device

Journal of Vacuum Science & Technology A
2022-09 | Journal article
Contributors: Taisei Motomura; Tatsuo Tabaru; Masato Uehara
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Crossref

Effect of RF power on AlN film crystallinity in low pressure range using Ar-20%N2 gases by magnetic mirror-type magnetron cathode

Japanese Journal of Applied Physics
2022-04-01 | Journal article
Contributors: Yuto Kawato; Taisei Motomura; Tatsuo Tabaru; Masato Uehara; Tetsuya Okuyama
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Crossref

Influence of nitrogen gas flow ratio on gallium nitride film growth using high-density convergent plasma sputtering device at room temperature

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
2021-01-01 | Journal article
Contributors: T. Motomura; T. Tabaru; Y. Fujio; T. Okuyama
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Crossref

Low-temperature AlN film deposition using magnetic mirror-type magnetron cathode for low gas pressure operation

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
2020-05-01 | Journal article
Contributors: Taisei Motomura; Tatsuo Tabaru; Masato Uehara; Yuki Fujio; Tetsuya Okuyama
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Crossref

Magnetron sputtering cathode for inward enlargement of doughnut-shaped plasma discharge area

Vacuum
2019 | Journal article
EID:

2-s2.0-85070932192

Contributors: Motomura, T.; Tabaru, T.
Source: Self-asserted source
Taisei Motomura via Scopus - Elsevier

Potential of High-density Convergent Plasma Sputtering Device for Magnetic Film Deposition

e-Journal of Surface Science and Nanotechnology
2019 | Journal article
EID:

2-s2.0-85065462906

Contributors: Motomura, T.; Tabaru, T.
Source: Self-asserted source
Taisei Motomura via Scopus - Elsevier

Investigation of the relationship between plasma etching characteristics and microstructures of alumina ceramics for chamber parts

Japanese Journal of Applied Physics
2019-04-01 | Journal article
Contributors: Yuji Kasashima; Tatsuo Tabaru; Osamu Matsuda; Taisei Motomura
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Crossref
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High-density convergent plasma sputtering device for a liquid metal target using an unheated glass plate

Review of Scientific Instruments
2018-06 | Journal article
Contributors: T. Motomura; T. Tabaru
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Magnetron sputtering cathode for low power density operation

AIP Advances
2017-12 | Journal article
Contributors: T. Motomura; T. Tabaru
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Crossref
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Evaluation of SF<sub>6</sub> Reactive Ion Etching Performance with a Permanent Magnet Located behind the Substrate based on a Simple Design Concept

Journal of the Vacuum Society of Japan
2016 | Journal article
Part of ISSN: 1882-2398
Contributors: Taisei MOTOMURA; Kazunori TAKAHASHI; Yuji KASASHIMA; Kazuya Kikunaga; Fumihiko UESUGI; Akira ANDO
Source: Self-asserted source
Taisei Motomura via Crossref Metadata Search
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Effect of External Magnetic Field on Compact Inductively-coupled Reactive Ion Etching Reactor

Journal of the Vacuum Society of Japan
2015 | Journal article
Part of ISSN: 1882-2398
Contributors: Taisei MOTOMURA; Kazunori TAKAHASHI; Yuji KASASHIMA; Fumihiko UESUGI; Akira ANDO
Source: Self-asserted source
Taisei Motomura via Crossref Metadata Search
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Instantaneous generation of many flaked particles caused by micro-arc discharge and detection method using load impedance monitoring system

2015 Joint e-Manufacturing and Design Collaboration Symposium (eMDC) &amp; 2015 International Symposium on Semiconductor Manufacturing (ISSM)
2015 | Journal article
WOSUID:

WOS:000380531700014

Contributors: Kasashima, Y.; Motomura, T.; Uesugi, F.; Ieee,
Source: Self-asserted source
Taisei Motomura via ResearcherID

Instantaneous generation of many flaked particles caused by micro-arc discharge and detection method using load impedance monitoring system-Yuji Kasashima

2015 Joint e-Manufacturing and Design Collaboration Symposium, eMDC 2015 and 2015 International Symposium on Semiconductor Manufacturing, ISSM 2015 - Proceedings
2015 | Conference paper
EID:

2-s2.0-84962439602

Contributors: Motomura, T.; Uesugi, F.
Source: Self-asserted source
Taisei Motomura via Scopus - Elsevier

Numerous flaked particles instantaneously generated by micro-arc discharge in mass-production plasma etching equipment

Japanese Journal of Applied Physics
2015 | Journal article
WOSUID:

WOS:000348959500031

Contributors: Kasashima, Y.; Motomura, T.; Nabeoka, N.; Uesugi, F.
Source: Self-asserted source
Taisei Motomura via ResearcherID
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A segmented multi-loop antenna for selective excitation of azimuthal mode number in a helicon plasma source

Review of Scientific Instruments
2014 | Journal article
WOSUID:

WOS:000342910500029

Contributors: Shinohara, S.; Tanikawa, T.; Motomura, T.
Source: Self-asserted source
Taisei Motomura via ResearcherID
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Detection of microarc discharge using a high-speed load impedance monitoring system

Applied Physics Express
2014 | Journal article
WOSUID:

WOS:000342863500032

Contributors: Kasashima, Y.; Motomura, T.; Kurita, H.; Kimura, N.; Uesugi, F.
Source: Self-asserted source
Taisei Motomura via ResearcherID
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In-situ detection method for wafer movement and micro-arc discharge around a wafer in plasma etching process using electrostatic chuck wafer stage with built-in acoustic emission sensor

Japanese Journal of Applied Physics
2014 | Journal article
WOSUID:

WOS:000337609900010

Contributors: Kasashima, Y.; Tabaru, T.; Yasaka, M.; Kobayashi, Y.; Akiyama, M.; Nabeoka, N.; Motomura, T.; Sakamoto, S.; Uesugi, F.
Source: Self-asserted source
Taisei Motomura via ResearcherID
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Note: Practical monitoring system using characteristic impedance measurement during plasma processing

Review of Scientific Instruments
2014 | Journal article
WOSUID:

WOS:000335919900302

Contributors: Motomura, T.; Kasashima, Y.; Fukuda, O.; Uesugi, F.; Kurita, H.; Kimura, N.
Source: Self-asserted source
Taisei Motomura via ResearcherID
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Real-time characteristic impedance monitoring for end-point and anomaly detection in the plasma etching process

Japanese Journal of Applied Physics
2014 | Journal article
WOSUID:

WOS:000337609900009

Contributors: Motomura, T.; Kasashima, Y.; Uesugi, F.; Kurita, H.; Kimura, N.
Source: Self-asserted source
Taisei Motomura via ResearcherID
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Transport of a helicon plasma by a convergent magnetic field for high speed and compact plasma etching

Journal of Physics D-Applied Physics
2014 | Journal article
WOSUID:

WOS:000343150100010

Contributors: Takahashi, K.; Motomura, T.; Ando, A.; Kasashima, Y.; Kikunaga, K.; Uesugi, F.; Hara, S.
Source: Self-asserted source
Taisei Motomura via ResearcherID
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Many flaked particles caused by impulsive force of electric field stress and effect of electrostriction stress in mass-production plasma etching equipment

Japanese Journal of Applied Physics
2014-03-06 | Journal article
Part of ISSN: 0021-4922
Contributors: Yuji Kasashima; Natsuko Nabeoka; Taisei Motomura; Fumihiko Uesugi
Source: Self-asserted source
Taisei Motomura via Crossref Metadata Search
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Characteristics of low-aspect ratio, large-diameter, high-density helicon plasmas with variable axial boundary conditions

Physics of Plasmas
2012 | Journal article
WOSUID:

WOS:000309592100048

Contributors: Motomura, T.; Shinohara, S.; Tanikawa, T.; Shamrai, K. P.
Source: Self-asserted source
Taisei Motomura via ResearcherID
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Study on Helicon Plasma Lissajous Acceleration for Electrodeless Electric Propulsion

TRANSACTIONS OF THE JAPAN SOCIETY FOR AERONAUTICAL AND SPACE SCIENCES, AEROSPACE TECHNOLOGY JAPAN
2012 | Journal article
Part of ISSN: 1884-0485
Contributors: Takahiro NAKAMURA; Kenji YOKOI; Hiroyuki NISHIDA; Takeshi MATSUOKA; Ikkoh FUNAKI; Shunjirou SHINOHARA; Takao TANIKAWA; Tohru HADA; Taisei MOTOMURA; Konstantin P. SHAMRAI et al.
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Taisei Motomura via Crossref Metadata Search
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Development of electrodeless electric propulsion systems using high-density helicon plasmas: The HEAT project

2011 XXXth URSI General Assembly and Scientific Symposium
2011-08 | Conference paper
Part of ISBN: 9781424451173
Contributors: Taisei Motomura; Shunjiro Shinohara; Takao Tanikawa; Tohru Hada; Ikkoh Funaki; Hiroyuki Nishida; Konstantin P. Shamrai; Takeshi Matsuoka; Fumiko Otsuka; Timofei S. Rudenko et al.
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Taisei Motomura via Crossref Metadata Search
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Large-area high-density helicon plasma sources

Plasma Sources Science &amp; Technology
2010 | Journal article
WOSUID:

WOS:000277982800019

Contributors: Shinohara, S.; Motomura, T.; Tanaka, K.; Tanikawa, T.; Shamrai, K. P.
Source: Self-asserted source
Taisei Motomura via ResearcherID
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Preliminary Study on Electrodeless Magneto-Plasma-Dynamic Thruster Using a Helicon Plasma Source

46th AIAA/ASME/SAE/ASEE Joint Propulsion Conference &amp; Exhibit
2010-07 | Conference paper
Part of ISBN: 9781600869587
Contributors: Hiroyuki Nishida; Shujiro Shinohara; Takao Tanikawa; Tohru Hada; Ikkoh Funaki; Takeshi Matsuoka; Kostiantyn Shamrai; Taisei Motomura
Source: Self-asserted source
Taisei Motomura via Crossref Metadata Search
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Development of high-density helicon plasma sources and their applications

Physics of Plasmas
2009-05 | Journal article
Part of ISSN: 1070-664X
Contributors: Shunjiro Shinohara; Tohru Hada; Taisei Motomura; Kenji Tanaka; Takao Tanikawa; Kyoichiro Toki; Yoshikazu Tanaka; Konstantin P. Shamrai
Source: Self-asserted source
Taisei Motomura via Crossref Metadata Search
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Peer review (4 reviews for 2 publications/grants)

Review activity for Journal of vacuum science and technology. (1)
Review activity for Vacuum. (3)