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Works (10)

Level set simulation of focused ion beam sputtering of a multilayer substrate

Beilstein Journal of Nanotechnology
2024-06-24 | Journal article
Contributors: Alexander V Rumyantsev; Nikolai I Borgardt; Roman L Volkov; Yuri A Chaplygin
Source: check_circle
Crossref

Study of silicon dioxide focused ion beam sputtering using electron microscopy imaging and level set simulation

Vacuum
2022-08 | Journal article
Contributors: Alexander V. Rumyantsev; Nikolai I. Borgardt; Roman L. Volkov; Yuri A. Chaplygin
Source: check_circle
Crossref

Characterizing interface structure between crystalline and ion bombarded silicon by transmission electron microscopy and molecular dynamics simulations

Applied Surface Science
2021 | Journal article
EID:

2-s2.0-85095914842

Part of ISSN: 01694332
Contributors: Rumyantsev, A.V.; Borgardt, N.I.; Prikhodko, A.S.; Chaplygin, Y.A.
Source: Self-asserted source
Alexander Rumyantsev via Scopus - Elsevier

Features of the Morphology and Structure of Thin Silicon Films

Journal of Surface Investigation
2021 | Journal article
EID:

2-s2.0-85104685428

Part of ISSN: 18197094 10274510
Contributors: Novak, A.V.; Novak, V.R.; Smirnov, D.I.; Rumyantsev, A.V.
Source: Self-asserted source
Alexander Rumyantsev via Scopus - Elsevier

Study of Gallium-Ion-Induced Silicon Amorphization by Matching Experimental and Simulated Electron-Microscopy Images

Journal of Surface Investigation
2020 | Journal article
EID:

2-s2.0-85092786636

Part of ISSN: 18197094 10274510
Contributors: Rumyantsev, A.V.; Prikhodko, A.S.; Borgardt, N.I.
Source: Self-asserted source
Alexander Rumyantsev via Scopus - Elsevier

Prediction of surface topography due to finite pixel spacing in focused ion beam milling of circular holes and trenches

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
2018 | Journal article
EID:

2-s2.0-85055768382

Part of ISBN:

21662754 21662746

Contributors: Rumyantsev, A.V.; Borgardt, N.I.
Source: Self-asserted source
Alexander Rumyantsev via Scopus - Elsevier

Simulation of Redeposited Silicon Sputtering under Focused Ion Beam Irradiation

Journal of Surface Investigation
2018 | Journal article
EID:

2-s2.0-85048710190

Part of ISBN:

18197094 10274510

Contributors: Rumyantsev, A.V.; Borgardt, N.I.; Volkov, R.L.
Source: Self-asserted source
Alexander Rumyantsev via Scopus - Elsevier

Sputtering of redeposited material in focused ion beam silicon processing

Materials Research Express
2018-02-21 | Journal article
Contributors: Nikolay I Borgardt; Alexander V Rumyantsev; Roman L Volkov; Yuri A Chaplygin
Source: check_circle
Crossref
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Preferred source (of 2)‎

Prediction of surface topography due to finite pixel spacing in FIB milling of rectangular boxes and trenches

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
2016 | Journal article
EID:

2-s2.0-84994745785

Contributors: Borgardt, N.I.; Rumyantsev, A.V.
Source: Self-asserted source
Alexander Rumyantsev via Scopus - Elsevier

Simulation of material sputtering with a focused ion beam

Technical Physics Letters
2015 | Journal article
EID:

2-s2.0-84938066720

Contributors: Borgardt, N.I.; Volkov, R.L.; Rumyantsev, A.V.; Chaplygin, Y.A.
Source: Self-asserted source
Alexander Rumyantsev via Scopus - Elsevier