Personal information

Synthetic Chemistry, Materials Chemistry
Canada, Venezuela

Activities

Employment (1)

Université Laval: Québec, Québec, CA

2023-01-01 to 2023-12-31 | Post-doctoral Fellow (Chemistry)
Employment
Source: Self-asserted source
Alvaro A Omaña

Education and qualifications (2)

University of Alberta: Edmonton, AB, CA

2017 to 2022 | Ph.D. (Chemistry) (Chemistry)
Education
Source: Self-asserted source
Alvaro A Omaña

University of Waterloo: Waterloo, Ontario, CA

2012 to 2017 | B.Sc. (Honours Co-op Chemistry) - Materials Chemistry (Chemistry)
Education
Source: Self-asserted source
Alvaro A Omaña

Works (6)

Frustrated Lewis pair-ligated tetrelenes

Dalton Transactions
2023 | Journal article | Author
Part of ISSN: 1477-9226
Part of ISSN: 1477-9234
Contributors: Alvaro A Omaña; Brandon Frenette; Eike Dornsiepen; Ryo Kobayashi; Michael J. Ferguson; Takeaki Iwamoto; Eric Rivard
Source: Self-asserted source
Alvaro A Omaña

Frustrated Lewis Pair Chelation and Reactivity of Complexed Parent Iminoborane and Aminoborane

Inorganic Chemistry
2022-10-17 | Journal article | Author
Part of ISSN: 0020-1669
Part of ISSN: 1520-510X
Contributors: Alvaro A Omaña; Ryan Watt; Yuqiao Zhou; Michael J. Ferguson; Eric Rivard
Source: Self-asserted source
Alvaro A Omaña

Ethylene/Propylene/Diene Terpolymers Grafted with Poly(methyl acrylate) by Reverse Atom Transfer Radical Polymerization

Macromolecular Chemistry and Physics
2021-10-07 | Journal article
Part of ISSN: 1022-1352
Part of ISSN: 1521-3935
Source: Self-asserted source
Alvaro A Omaña

Access to adducts of parent iminoborane isomers, HBNH and NBH2, using frustrated Lewis pair chelation

Chemical Communications
2021-09-10 | Journal article
Part of ISSN: 1359-7345
Part of ISSN: 1364-548X
Source: Self-asserted source
Alvaro A Omaña

Molecular Main Group Metal Hydrides

Chemical Reviews
2021-08-27 | Journal article
Part of ISSN: 0009-2665
Part of ISSN: 1520-6890
Source: Self-asserted source
Alvaro A Omaña

Frustrated Lewis Pair Chelation as a Vehicle for Low‐Temperature Semiconductor Element and Polymer Deposition

Angewandte Chemie International Edition
2021-01-04 | Journal article
Part of ISSN: 1433-7851
Part of ISSN: 1521-3773
Source: Self-asserted source
Alvaro A Omaña