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Scopus Author ID: 7004621388

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Czech Republic

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Employment (2)

Eaton Corporation: Roztoky, CZ

2017-10-01 to present
Employment
Source: Self-asserted source
Stanislav Kadlec

HVM Plasma (Czechia): Prague, CZ

2010-01-01 to 2017-09-30
Employment
Source: Self-asserted source
Stanislav Kadlec

Works (43)

Capturing photoionization shadows in streamer simulations using the discrete ordinates method

Plasma Sources Science and Technology
2023-10-01 | Journal article
DOI: 10.1088/1361-6595/acfcd8
Contributors: Jan Tungli; Miroslav Horký; Stanislav Kadlec; Zdeněk Bonaventura
Source: check_circle
Crossref

Long-term stability and disappearing anode effects during reactive DC and pulsed bipolar magnetron sputtering of Al<sub>2</sub>O<sub>3</sub>

Vacuum
2020 | Journal article
DOI: 10.1016/j.vacuum.2019.109161
EID:

2-s2.0-85077301881

Part of ISSN: 0042207X
Contributors: Mareš, P.; Kadlec, S.; Dubau, M.; Marek, A.; Vyskočil, J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Effect of magnetic field on the formation of Cu nanoparticles during magnetron sputtering in the gas aggregation cluster source

Plasma Processes and Polymers
2019 | Journal article
DOI: 10.1002/ppap.201900133
EID:

2-s2.0-85070671408

Part of ISSN: 16128869 16128850
Contributors: Vaidulych, M.; Hanuš, J.; Kousal, J.; Kadlec, S.; Marek, A.; Khalakhan, I.; Shelemin, A.; Solař, P.; Choukourov, A.; Kylián, O. et al.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Return of target material ions leads to a reduced hysteresis in reactive high power impulse magnetron sputtering: Experiment

Journal of Applied Physics
2017 | Journal article
DOI: 10.1063/1.4977816
EID:

2-s2.0-85015409736

Part of ISSN: 10897550 00218979
Contributors: Čapek, J.; Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Return of target material ions leads to a reduced hysteresis in reactive high power impulse magnetron sputtering: Model

Journal of Applied Physics
2017 | Journal article
DOI: 10.1063/1.4977815
EID:

2-s2.0-85015433002

Part of ISSN: 10897550 00218979
Contributors: Kadlec, S.; Čapek, J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Gas aggregation nanocluster source - Reactive sputter deposition of copper and titanium nanoclusters

Surface and Coatings Technology
2011 | Journal article
DOI: 10.1016/j.surfcoat.2010.12.027
EID:

2-s2.0-79959784355

Part of ISSN: 02578972
Contributors: Marek, A.; Valter, J.; Kadlec, S.; Vyskočil, J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Computer simulation of magnetron sputtering - Experience from the industry

Surface and Coatings Technology
2007 | Journal article
DOI: 10.1016/j.surfcoat.2007.06.043
EID:

2-s2.0-36048982214

Part of ISSN: 02578972
Contributors: Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Simulation of neutral particle flow during high power magnetron impulse

Plasma Processes and Polymers
2007 | Journal article
DOI: 10.1002/ppap.200731101
EID:

2-s2.0-42549157314

Part of ISSN: 16128850 16128869
Contributors: Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Mechanism of the film composition formation during magnetron sputtering of WTi

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
2001 | Journal article
DOI: 10.1116/1.1392401
EID:

2-s2.0-0035441835

Part of ISSN: 07342101
Contributors: Shaginyan, L.R.; Mišina, M.; Kadlec, S.; Jastrabík, L.; Macková, A.; Peřina, V.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Study of plasma parameters in a BAI 730 M triode ion plating system by means of a Langmuir probe and plasma mass and energy spectroscopy

Surface and Coatings Technology
2001 | Journal article
DOI: 10.1016/S0257-8972(00)00998-1
EID:

2-s2.0-0034745892

Part of ISSN: 02578972
Contributors: Maček, M.; Navinšek, B.; Panjan, P.; Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Energy and mass spectroscopy studies during triode ion plating of TiN films in two different layouts

Surface and Coatings Technology
1999 | Journal article
DOI: 10.1016/S0257-8972(98)00839-1
EID:

2-s2.0-0032650186

Part of ISSN: 02578972
Contributors: Maček, M.; Navinšek, B.; Panjan, P.; Kadlec, S.; Wouters, S.; Quaeyhaegens, C.; Stals, L.M.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Plasma diagnostics of triode ion-plating systems by energy-resolved mass spectroscopy and comparison of TiN film properties

Surface and Coatings Technology
1999 | Journal article
DOI: 10.1016/S0257-8972(99)00225-X
EID:

2-s2.0-0040355672

Part of ISSN: 02578972
Contributors: Kadlec, S.; MačEk, M.; Wouters, S.; Meert, B.; Navinšek, B.; Panjan, P.; Quaeyhaegens, C.; Stals, L.M.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Composite TiN-Ni thin films deposited by reactive magnetron sputter ion-plating

Surface and Coatings Technology
1998 | Journal article
DOI: 10.1016/S0257-8972(98)00688-4
EID:

2-s2.0-0032288583

Part of ISSN: 02578972
Contributors: Mišina, M.; Musil, J.; Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Plasma diagnostics in a triode ion plating system

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
1998 | Journal article
DOI: 10.1116/1.581426
EID:

2-s2.0-0032383097

Part of ISSN: 07342101
Contributors: Wouters, S.; Kadlec, S.; Quaeyhaegens, C.; Stals, L.M.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

W/WC diffusion barrier layers for CVD diamond coatings deposited on WC-Co: Micro structure and properties

Surface and Coatings Technology
1998 | Journal article
DOI: 10.1016/S0257-8972(97)00553-7
EID:

2-s2.0-0000038867

Part of ISSN: 02578972
Contributors: Vandierendonck, K.; Nesládek, M.; Kadlec, S.; Quaeyhaegens, C.; Van Stappen, M.; Stals, L.M.M.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Energy distribution of ions in an unbalanced magnetron plasma measured with energy-resolved mass spectrometry

Surface and Coatings Technology
1997 | Journal article
DOI: 10.1016/S0257-8972(96)03088-5
EID:

2-s2.0-0031071206

Part of ISSN: 02578972
Contributors: Kadlec, S.; Quaeyhaegens, C.; Knuyt, G.; Stals, L.M.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Energy-resolved mass spectra of ions and neutrals in triode ion plating of Ti(C,N) coatings

Surface and Coatings Technology
1997 | Journal article
DOI: 10.1016/S0257-8972(96)03136-2
EID:

2-s2.0-0031169789

Part of ISSN: 02578972
Contributors: Wouters, S.; Kadlec, S.; Quaeyhaegens, C.; Stals, L.M.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Energy-resolved mass spectrometry and Monte Carlo simulation of atomic transport in magnetron sputtering

Surface and Coatings Technology
1997 | Journal article
DOI: 10.1016/S0257-8972(97)00375-7
EID:

2-s2.0-0031386714

Part of ISSN: 02578972
Contributors: Kadlec, S.; Quaeyhaegens, C.; Knuyt, G.; Stals, L.M.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Influence of the plasma current to Ti-melt on the plasma parameters and microstructure of TiN coatings in the triode ion plating system

Surface and Coatings Technology
1997 | Journal article
DOI: 10.1016/S0257-8972(97)00385-X
EID:

2-s2.0-0031342324

Part of ISSN: 02578972
Contributors: Wouters, S.; Kadlec, S.; Quaeyhaegens, C.; Stals, L.M.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Discharge characteristics of a facing target sputtering device using unbalanced magnetrons

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
1996 | Journal article
DOI: 10.1116/1.580044
EID:

2-s2.0-0030520568

Part of ISSN: 07342101
Contributors: Muralidhar, G.K.; Musil, J.; Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Low pressure magnetron sputtering and selfsputtering discharges

Vacuum
1996 | Journal article
DOI: 10.1016/0042-207X(96)80013-3
EID:

2-s2.0-0030108633

Part of ISSN: 0042207X
Contributors: Kadlec, S.; Musil, J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

An unbalanced magnetron sputtering device for low and medium pressures

Review of Scientific Instruments
1995 | Journal article
DOI: 10.1063/1.1146181
EID:

2-s2.0-36449008600

Part of ISSN: 00346748
Contributors: Muralidhar, G.K.; Musil, J.; Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Complex XRD microstructural studies of hard coatings applied to PVD-deposited TiN films Part II. Transition from porous to compact films and microstructural inhomogeneity of the layers

Thin Solid Films
1995 | Journal article
DOI: 10.1016/0040-6090(95)06694-2
EID:

2-s2.0-0029404266

Part of ISSN: 00406090
Contributors: Kužel Jr., R.; Černý, R.; Valvoda, V.; Blomberg, M.; Merisalo, M.; Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Energy and mass spectra of ions in triode ion plating of Ti(C,N) coatings

Surface and Coatings Technology
1995 | Journal article
DOI: 10.1016/0257-8972(95)02569-3
EID:

2-s2.0-0029409215

Part of ISSN: 02578972
Contributors: Wouters, S.; Kadlec, S.; Nesládek, M.; Quaeyhaegens, C.; Stals, L.M.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Optimized Magnetic Field Shape for Low Pressure Magnetron Sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
1995 | Journal article
DOI: 10.1116/1.579369
EID:

2-s2.0-0029277071

Part of ISSN: 15208559 07342101
Contributors: Kadlec, S.; Musil, J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Microstructure of titanium nitride thin films controlled by ion bombardment in a magnetron-sputtering device

Surface and Coatings Technology
1994 | Journal article
DOI: 10.1016/S0257-8972(09)90011-1
EID:

2-s2.0-0028438482

Part of ISSN: 02578972
Contributors: Černý, R.; Kužel, R.; Valvoda, V.; Kadlec, S.; Musil, J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Growth and properties of hard coatings prepared by physical vapor deposition methods

Surface and Coatings Technology
1992 | Journal article
DOI: 10.1016/S0257-8972(09)90064-0
EID:

2-s2.0-33645356621

Part of ISSN: 02578972
Contributors: Kadlec, S.; Musil, J.; Vyskočil, J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Low-energy (~ 100 eV) ion irradiation during growth of TiN deposited by reactive magnetron sputtering: Effects of ion flux on film microstructure

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
1991 | Journal article
DOI: 10.1116/1.577428
EID:

2-s2.0-84957228669

Part of ISSN: 15208559 07342101
Contributors: Hultman, L.; Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

On picostructural models of physically vapor-deposited films of titanium nitride

Surface and Coatings Technology
1991 | Journal article
DOI: 10.1016/0257-8972(91)90052-X
EID:

2-s2.0-0026389282

Part of ISSN: 02578972
Contributors: Valvoda, V.; Perry, A.J.; Hultman, L.; Musil, J.; Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Unbalanced magnetrons and new sputtering systems with enhanced plasma Ionization

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
1991 | Journal article
DOI: 10.1116/1.577597
EID:

2-s2.0-0038576097

Part of ISSN: 15208559 07342101
Contributors: Musil, J.; Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Ion-assisted sputtering of TiN films

Surface and Coatings Technology
1990 | Journal article
DOI: 10.1016/0257-8972(90)90079-R
EID:

2-s2.0-0025701315

Part of ISSN: 02578972
Contributors: Musil, J.; Kadlec, S.; Valvoda, V.; Kužel Jr., R.; Černý, R.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Modeling of inhomogeneous film deposition and target erosion in reactive sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
1990 | Journal article
DOI: 10.1116/1.576765
EID:

2-s2.0-0001322973

Part of ISSN: 15208559 07342101
Contributors: Kadlec, S.; Musil, J.; Vyskočil, J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Reactive sputtering of TiN films at large substrate to target distances

Vacuum
1990 | Journal article
DOI: 10.1016/0042-207X(90)90241-P
EID:

2-s2.0-0025644098

Part of ISSN: 0042207X
Contributors: Musil, J.; Kadlec, S.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Sputtering systems with magnetically enhanced ionization for ion plating of TiN films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
1990 | Journal article
DOI: 10.1116/1.576874
EID:

2-s2.0-84955039415

Part of ISSN: 15208559 07342101
Contributors: Kadlec, S.; Musil, J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Structural analysis of tin films by Seemann-Bohlin X-ray diffraction

Thin Solid Films
1990 | Journal article
DOI: 10.1016/S0040-6090(05)80050-1
EID:

2-s2.0-0025664315

Part of ISSN: 00406090
Contributors: Valvoda, V.; Kužlel Jr., R.; černý, R.; Rafaja, D.; Musil, J.; Kadlec, S.; Perry, A.J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

TiN films grown by reactive magnetron sputtering with enhanced ionization at low discharge pressures

Vacuum
1990 | Journal article
DOI: 10.1016/0042-207X(90)94233-G
EID:

2-s2.0-0025625805

Part of ISSN: 0042207X
Contributors: Kadlec, S.; Musil, J.; Valvoda, V.; Münz, W.-D.; Petersein, H.; Schroeder, J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Effect of ion bombardment on the structure of sputtered TiN films

Nuclear Inst. and Methods in Physics Research, B
1989 | Journal article
DOI: 10.1016/0168-583X(89)90323-6
EID:

2-s2.0-0024607168

Part of ISSN: 0168583X
Contributors: Musil, J.; Poulek, V.; Kadlec, S.; Vyskočil, J.; Valvoda, V.; Černý, R.; Kužel Jr., R.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Reactive deposition of hard coatings

Surface and Coatings Technology
1989 | Journal article
DOI: 10.1016/0257-8972(89)90064-9
EID:

2-s2.0-0024874593

Part of ISSN: 02578972
Contributors: Musil, J.; Kadlec, S.; Vyskočil, J.; Poulek, V.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Reactive deposition of tin films using an unbalanced magnetron

Surface and Coatings Technology
1989 | Journal article
DOI: 10.1016/S0257-8972(89)80010-6
EID:

2-s2.0-0024915643

Part of ISSN: 02578972
Contributors: Kadlec, S.; Musil, J.; Münz, W.-D.; Hakanson, G.; Sundgren, J.-E.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Influence of deposition rate on properties of reactively sputtered TiN<sub>x</sub> films

Vacuum
1988 | Journal article
DOI: 10.1016/0042-207X(88)90588-X
EID:

2-s2.0-0023844348

Part of ISSN: 0042207X
Contributors: Musil, J.; Poulek, V.; Vyskočil, J.; Kadlec, S.; Valvoda, V.; Kužel Jr., R.; Černý, R.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

New results in d.c. reactive magnetron deposition of TiN<sub>x</sub> films

Thin Solid Films
1988 | Journal article
DOI: 10.1016/0040-6090(88)90487-7
EID:

2-s2.0-0024128734

Part of ISSN: 00406090
Contributors: Musil, J.; Kadlec, S.; Vyskočil, J.; Valvoda, V.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Influence of the pumping speed on the hysteresis effect in the reactive sputtering of thin films

Vacuum
1987 | Journal article
DOI: 10.1016/0042-207X(87)90262-4
EID:

2-s2.0-0023596715

Part of ISSN: 0042207X
Contributors: Kadlec, S.; Musil, J.; Vyskočil, J.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier

Hysteresis effect in reactive sputtering: A problem of system stability

Journal of Physics D: Applied Physics
1986 | Journal article
DOI: 10.1088/0022-3727/19/9/004
EID:

2-s2.0-0022772616

Part of ISSN: 00223727
Contributors: Kadlec, S.; Musil, J.; Vyskocil, H.
Source: Self-asserted source
Stanislav Kadlec via Scopus - Elsevier
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