Personal information

Other IDs

Scopus Author ID: 35737808500

Activities

Collapse all

Works (26)

Effects of Seed Processing with Cold Plasma on Growth and Biochemical Traits of <i>Stevia rebaudiana</i> Bertoni Under Different Cultivation Conditions: In Soil Versus Aeroponics

Plants
2025-01 | Journal article | Author
DOI: 10.3390/plants14020271
Contributors: Auguste Judickaite; Emilija Jankaitytė; Evaldas Ramanciuškas; Laima Degutytė-Fomins; Zita Naučienė; Gediminas Kudirka; Takamasa Okumura; Kazunori Koga; Masaharu Shiratani; Vida Mildaziene et al.
Source: check_circle
Multidisciplinary Digital Publishing Institute

Comparison between Ar+CH<inf>4</inf> cathode and anode coupling chemical vapor depositions of hydrogenated amorphous carbon films

Thin Solid Films
2021 | Journal article
DOI: 10.1016/j.tsf.2021.138701
EID:

2-s2.0-85104921818

Part of ISSN: 00406090
Contributors: Hwang, S.-H.; Iwamoto, R.; Okumura, T.; Kamataki, K.; Itagaki, N.; Koga, K.; Nakatani, T.; Shiratani, M.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Impact of atmospheric pressure plasma treated seeds on germination, morphology, gene expression and biochemical responses

Japanese Journal of Applied Physics
2021 | Journal article
DOI: 10.35848/1347-4065/abe47d
EID:

2-s2.0-85103493959

Part of ISSN: 13474065 00214922
Contributors: Attri, P.; Koga, K.; Okumura, T.; Shiratani, M.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Impact of seed color and storage time on the radish seed germination and sprout growth in plasma agriculture

Scientific Reports
2021 | Journal article
DOI: 10.1038/s41598-021-81175-x
EID:

2-s2.0-85100089767

Part of ISSN: 20452322
Contributors: Attri, P.; Ishikawa, K.; Okumura, T.; Koga, K.; Shiratani, M.; Mildaziene, V.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Time of flight size control of carbon nanoparticles using ar+ch<inf>4</inf> multi-hollow discharge plasma chemical vapor deposition method

Processes
2021 | Journal article
DOI: 10.3390/pr9010002
EID:

2-s2.0-85098478863

Part of ISSN: 22279717
Contributors: Hwang, S.H.; Koga, K.; Hao, Y.; Attri, P.; Okumura, T.; Kamataki, K.; Itagaki, N.; Shiratani, M.; Oh, J.-S.; Takabayashi, S. et al.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Low-stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition

Japanese Journal of Applied Physics
2020 | Journal article
DOI: 10.35848/1347-4065/abbb20
EID:

2-s2.0-85094127768

Part of ISSN: 13474065 00214922
Contributors: Hwang, S.-H.; Okumura, T.; Kamataki, K.; Itagaki, N.; Koga, K.; Nakatani, T.; Shiratani, M.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Size and flux of carbon nanoparticles synthesized by Ar+CH<inf>4</inf> multi-hollow plasma chemical vapor deposition

Diamond and Related Materials
2020 | Journal article
DOI: 10.1016/j.diamond.2020.108050
EID:

2-s2.0-85090205629

Part of ISSN: 09259635
Contributors: Hwang, S.-H.; Okumura, T.; Kamataki, K.; Itagaki, N.; Koga, K.; Shiratani, M.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Plasma Agriculture from Laboratory to Farm: A Review

Processes
2020-08 | Journal article | Author
DOI: 10.3390/pr8081002
Contributors: Pankaj Attri; Kenji Ishikawa; Takamasa Okumura; Kazunori Koga; Masaharu Shiratani
Source: check_circle
Multidisciplinary Digital Publishing Institute
grade
Preferred source (of 2)‎

Effect of plasma-generator-supplied nanosecond pulsed current on cell response

Journal of Physics D: Applied Physics
2019 | Journal article
DOI: 10.1088/1361-6463/ab0733
EID:

2-s2.0-85064131984

Part of ISSN: 13616463 00223727
Contributors: Chang, C.-H.; Yano, K.-I.; Okumura, T.; Sato, T.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Development of automatically controlled corona plasma system for inactivation of pathogen in hydroponic cultivation medium of tomato

Journal of Electrostatics
2018 | Journal article
DOI: 10.1016/j.elstat.2017.12.006
EID:

2-s2.0-85039988270

Part of ISSN: 03043886
Contributors: Takahashi, K.; Saito, Y.; Oikawa, R.; Okumura, T.; Takaki, K.; Fujio, T.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Electric potential developed by single-pulse needle-water discharge

Applied Physics Express
2018 | Journal article
DOI: 10.7567/APEX.11.016201
EID:

2-s2.0-85040023952

Part of ISSN: 18820786 18820778
Contributors: Okumura, T.; Zhou, C.; Kubo, E.; Shimizu, T.; Nakajima, T.; Sato, T.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Inactivation of Ralstonia solanacearum using pulse discharge under culture solution in hydroponics

IEEE International Pulsed Power Conference
2018 | Conference paper
DOI: 10.1109/PPC.2017.8291293
EID:

2-s2.0-85054231475

Part of ISSN: 21584923 21584915
Contributors: Saito, Y.; Takahashi, K.; Takaki, K.; Satta, N.; Okumura, T.; Fujio, T.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Influence of pulsed electric field on enzymes, bacteria and volatile flavor compounds of unpasteurized sake

Plasma Science and Technology
2018 | Journal article
DOI: 10.1088/2058-6272/aaa400
EID:

2-s2.0-85045018263

Part of ISSN: 20586272 10090630
Contributors: Okumura, T.; Yaegashi, T.; Fujiwara, T.; Takahashi, K.; Takaki, K.; Kudo, T.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Alternating current breakdown voltage of ice electret

Journal of Physics: Conference Series
2017 | Conference paper
DOI: 10.1088/1742-6596/897/1/012006
EID:

2-s2.0-85032449561

Part of ISSN: 17426596 17426588
Contributors: Oshika, Y.; Tsuchiya, Y.; Okumura, T.; Muramoto, Y.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

External AC electric field-induced conformational change in bovine serum albumin

IEEE Transactions on Plasma Science
2017 | Journal article
DOI: 10.1109/TPS.2017.2657748
EID:

2-s2.0-85012979737

Part of ISSN: 00933813
Contributors: Okumura, T.; Yamada, K.; Yaegashi, T.; Takahashi, K.; Syuto, B.; Takaki, K.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Inactivation of bacteria using discharge plasma under liquid fertilizer in a hydroponic culture system

Plasma Medicine
2016 | Journal article
DOI: 10.1615/PlasmaMed.2016018683
EID:

2-s2.0-85020388619

Part of ISSN: 19475772 19475764
Contributors: Okumura, T.; Saito, Y.; Takano, K.; Takahashi, K.; Takaki, K.; Satta, N.; Fujio, T.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Long period preservation of marine products using electrostatic field

Japanese Journal of Applied Physics
2016 | Journal article
DOI: 10.7567/JJAP.55.07LG07
EID:

2-s2.0-85044985677

Part of ISSN: 13474065 00214922
Contributors: Okumura, T.; Yaegashi, T.; Yamada, K.; Ito, T.; Takahashi, K.; Aisawa, S.; Takaki, K.; Yamazaki, S.; Syuto, B.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Dependency of arabidopsis thaliana growth on DC electric field intensity

IEEE Transactions on Dielectrics and Electrical Insulation
2014 | Journal article
DOI: 10.1109/TDEI.2013.004085
EID:

2-s2.0-84898687708

Part of ISSN: 10709878
Contributors: Okumura, T.; Muramoto, Y.; Shimizu, N.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Polarity effect on growth acceleration of arabidopsis thaliana by DC electric field

Proceedings of IEEE International Conference on Solid Dielectrics, ICSD
2013 | Conference paper
DOI: 10.1109/ICSD.2013.6619702
EID:

2-s2.0-84891604961

Part of ISSN: 15535282 21591687
Contributors: Okumura, T.; Muramoto, Y.; Shimizu, N.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Dependency of growth of Arabidopsis thaliana on intensity of D.C. electric field

Annual Report - Conference on Electrical Insulation and Dielectric Phenomena, CEIDP
2012 | Conference paper
DOI: 10.1109/CEIDP.2012.6378769
EID:

2-s2.0-84872057621

Part of ISSN: 00849162
Contributors: Okumura, T.; Muramoto, Y.; Shimizu, N.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Influence of DC electric field on growth of daikon radish (Raphanus sativus)

IEEE Transactions on Dielectrics and Electrical Insulation
2012 | Journal article
DOI: 10.1109/TDEI.2012.6396985
EID:

2-s2.0-84872148152

Part of ISSN: 10709878
Contributors: Okumura, T.; Muramoto, Y.; Shimizu, N.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Influence of A.C. electric field on plant growth

Annual Report - Conference on Electrical Insulation and Dielectric Phenomena, CEIDP
2011 | Conference paper
DOI: 10.1109/CEIDP.2011.6232626
EID:

2-s2.0-84864681566

Part of ISSN: 00849162
Contributors: Iwata, S.; Okumura, T.; Muramoto, Y.; Shimizu, N.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Optimum D.C. electric field strength for growth acceleration of thale cress

Annual Report - Conference on Electrical Insulation and Dielectric Phenomena, CEIDP
2011 | Conference paper
DOI: 10.1109/CEIDP.2011.6232623
EID:

2-s2.0-84864709684

Part of ISSN: 00849162
Contributors: Okumura, T.; Iwata, S.; Muramoto, Y.; Shimizu, N.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Acceleration of plant growth by D.C. electric field

Proceedings of the 2010 IEEE International Conference on Solid Dielectrics, ICSD 2010
2010 | Conference paper
DOI: 10.1109/ICSD.2010.5568265
EID:

2-s2.0-77958051762
Contributors: Okumura, T.; Muramoto, Y.; Shimizu, N.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Influence of D.C. electric field on growth of Arabidopsis thaliana (thale-cress)

Annual Report - Conference on Electrical Insulation and Dielectric Phenomena, CEIDP
2010 | Conference paper
DOI: 10.1109/CEIDP.2010.5724001
EID:

2-s2.0-79952947164

Part of ISSN: 00849162
Contributors: Okumura, T.; Muramoto, Y.; Shimizu, N.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier

Influence of electric field on plant weight

Annual Report - Conference on Electrical Insulation and Dielectric Phenomena, CEIDP
2009 | Conference paper
DOI: 10.1109/CEIDP.2009.5377852
EID:

2-s2.0-77949276159

Part of ISSN: 00849162
Contributors: Okumura, T.; Muramoto, Y.; Shimizu, N.
Source: Self-asserted source
Takamasa Okumura via Scopus - Elsevier
How many people are using ORCID?