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Mapping unit-cell thickness variations in thin films by post-deposition reflection high-energy electron diffraction

Physical Review Materials
2020-08-20 | Journal article
Contributors: A. E. M. Smink; Y. A. Birkhölzer; J. van Dam; F. J. G. Roesthuis; G. Rijnders; H. Hilgenkamp; G. Koster
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