Sang Chan Lee (0000-0001-9886-4373) - ORCID

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Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex

Applied Surface Science

2016-01 | Journal article

DOI: 10.1016/j.apsusc.2015.11.095

Contributors: Jeong Hwan Han; Hyo Yeon Kim; Sang Chan Lee; Da Hye Kim; Bo Keun Park; Jin-Seong Park; Dong Ju Jeon; Taek-Mo Chung; Chang Gyoun Kim

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