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Osaka University: Ibaraki, Osaka, JP

1996-06-01 to present | Professor (SANKEN (The Institute of Scientific and Industrial Reserach))
Employment
Source: Self-asserted source
Takahiro Kozawa

Works (50 of 151)

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Page 1 of 4

Effect of organic ligand and metal nanocluster core structure on resist performance of inorganic-organic hybrid resist materials for EUV and EB lithography

Japanese Journal of Applied Physics
2025-03-01 | Journal article
DOI: 10.35848/1347-4065/adba6c
Contributors: Hiroki Yamamoto; Takashi Hamada; Yusa Muroya; Kazumasa Okamoto; Shuhei Shimoda; Takahiro Kozawa
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Crossref

Influence of underlayer on development of chemically amplified photoresist film in tetramethylammonium hydroxide (TMAH) aqueous developer

Japanese Journal of Applied Physics
2025-03-01 | Journal article
DOI: 10.35848/1347-4065/adb5e2
Contributors: Jiahao Wang; Takahiro Kozawa
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Crossref

Kinetics of the Oxidation of the [2Fe-2S] Cluster in SoxR by Redox-Active Compounds as Studied by Pulse Radiolysis

Biochemistry
2025-02-18 | Journal article
DOI: 10.1021/acs.biochem.4c00679
Contributors: Kazuo Kobayashi; Takahiro Tanaka; Takahiro Kozawa
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Crossref

Reaction mechanisms of Sn-based polarity-change copolymer resists with different counter anions, designed for extreme ultraviolet lithography

Japanese Journal of Applied Physics
2025-02-01 | Journal article
DOI: 10.35848/1347-4065/adaefd
Contributors: Kohei Hashimoto; Yui Takata; Yusa Muroya; Takahiro Kozawa; Kohei Machida; Satoshi Enomoto; Bilal Naqvi; Danilo De Simone
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Synthesis of Polystyrene-block-poly(3-hydroxy-1-methacryloyloxyadamantane) (PS-b-PHAdMA) via RAFT polymerization as candidate block copolymers for next generation lithography

Polymer
2024-12-24 | Journal article
DOI: 10.1016/j.polymer.2024.127983
Part of ISSN: 0032-3861
Contributors: HIROKI YAMAMOTO; Francis McCallum; Hui Peng; Idriss Blakey; Shin Hasegawa; Yasunari Maekawa; Takahiro Kozawa; Andrew K. Whittaker
Source: Self-asserted source
Takahiro Kozawa

Quartz crystal microbalance analysis of effects of surfactants on dissolution kinetics of poly(4-hydroxystyrene) partially protected by t-butoxycarbonyl group

Japanese Journal of Applied Physics
2024-11-01 | Journal article
DOI: 10.35848/1347-4065/ad8b8a
Contributors: Hitomi Betsumiya; Mikiko Kozawa; Takahiro Kozawa; Takashi Hasebe; Kazuo Sakamoto; Makoto Muramatsu
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Relationship between the surface free energy of underlayers and the dissolution kinetics of poly(4-hydroxystyrene) partially protected by t-butoxycarbonyl groups in tetramethylammonium hydroxide aqueous developer

Japanese Journal of Applied Physics
2024-09-02 | Journal article
DOI: 10.35848/1347-4065/ad6f86
Contributors: Jiahao Wang; Takahiro Kozawa
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Corrigendum: “Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution” [Jpn. J. Appl. Phys. 61, 016502 (2022)]

Japanese Journal of Applied Physics
2024-08-01 | Journal article
DOI: 10.35848/1347-4065/ad66a2
Contributors: Yuko Tsutsui Ito; Takahiro Kozawa
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Effects of acid generator anions on radiation-induced decomposition and dissolution kinetics of chemically amplified resists

Japanese Journal of Applied Physics
2024-08-01 | Journal article
DOI: 10.35848/1347-4065/ad6b6a
Contributors: Yoshika Tsuda; Yusa Muroya; Takahiro Kozawa; Takuya Ikeda; Yoshitaka Komuro
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Stratified polymer dissolution model based on impedance data from quartz crystal microbalance method

Applied Physics Express
2024-08-01 | Journal article
DOI: 10.35848/1882-0786/ad6ad0
Contributors: Yuqing Jin; Yuko Tsutsui Ito; Takahiro Kozawa; Takashi Hasebe; Kazuo Sakamoto; Makoto Muramatsu
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Crossref

Dissolution dynamics of partially protected poly(4-hydroxystyrene) in organic developers investigated by a quartz crystal microbalance (QCM) method

Japanese Journal of Applied Physics
2024-07-01 | Journal article
DOI: 10.35848/1347-4065/ad5e27
Contributors: Yuko Tsutsui Ito; Kyoko Watanabe; Takahiro Kozawa; Kazuo Sakamoto; Makoto Muramatsu
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Crossref

Dissolution dynamics of poly(4-hydroxystyrene) partially protected with t-butoxycarbonyl group in alkyltrimethylammonium hydroxide aqueous developers

Japanese Journal of Applied Physics
2024-07-01 | Journal article
DOI: 10.35848/1347-4065/ad5e26
Contributors: Jiahao Wang; Takahiro Kozawa
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Crossref

Effects of substituents in triphenylsulfonium cation on its radiation-induced decomposition and dissolution kinetics of chemically amplified resists

Japanese Journal of Applied Physics
2024-07-01 | Journal article
DOI: 10.35848/1347-4065/ad56ea
Contributors: Yoshika Tsuda; Yusa Muroya; Kazumasa Okamoto; Takahiro Kozawa; Takuya Ikeda; Yoshitaka Komuro
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Crossref

Design strategy of extreme ultraviolet resists

Japanese Journal of Applied Physics
2024-05-01 | Journal article
DOI: 10.35848/1347-4065/ad3a4c
Contributors: Takahiro Kozawa
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A study on the resist performance of inorganic-organic resist materials for EUV and electron-beam lithography

Japanese Journal of Applied Physics
2024-04-01 | Journal article
DOI: 10.35848/1347-4065/ad38c5
Contributors: Hiroki Yamamoto; Yuko Tsutsui Ito; Kazumasa Okamoto; Shuhei Shimoda; Takahiro Kozawa
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Dissolution dynamics of poly(4-hydroxystyrene) in potassium hydroxide (KOH) and sodium hydroxide (NaOH) aqueous solutions investigated by quartz crystal microbalance (QCM) method

Japanese Journal of Applied Physics
2024-04-01 | Journal article
DOI: 10.35848/1347-4065/ad3373
Contributors: Yuko Tsutsui Ito; Kyoko Watanabe; Takahiro Kozawa; Kazuo Sakamoto; Makoto Muramatsu
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Crossref

Dissolution dynamics of zirconia nanocluster resist

Japanese Journal of Applied Physics
2024-04-01 | Journal article
DOI: 10.35848/1347-4065/ad313f
Contributors: Yuko Tsutsui Ito; Takahiro Kozawa; Kazuo Sakamoto; Makoto Muramatsu
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Crossref

Dissolution dynamics of poly(4-hydroxystyrene-co-methacrylic acid) in tetraalkylammonium hydroxide aqueous solutions

Japanese Journal of Applied Physics
2024-02-29 | Journal article
DOI: 10.35848/1347-4065/ad2302
Contributors: Yutaro Iwashige; Kyoko Watanabe; Yuko Tsutsui Ito; Takahiro Kozawa; Kazuo Sakamoto; Makoto Muramatsu
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Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist─Utilizing Radical- and Acid-Amplified Cross-Linking

Chemistry of Materials
2024-02-13 | Journal article
DOI: 10.1021/acs.chemmater.3c02628
Contributors: Bilal A. Naqvi; Satoshi Enomoto; Kohei Machida; Yui Takata; Takahiro Kozawa; Yusa Muroya; Stefan De Gendt; Danilo De Simone
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Crossref

Relationship between poly(4-hydroxystyrene) (PHS) and tetramethylammonium hydroxide (TMAH) concentrations during the development of PHS films in TMAH aqueous solution studied by a quartz crystal microbalance (QCM) method

Japanese Journal of Applied Physics
2024-01-01 | Journal article
DOI: 10.35848/1347-4065/ad17dd
Contributors: Yuko Tsutsui Ito; Kyoko Watanabe; Yuqing Jin; Takahiro Kozawa; Kazuo Sakamoto; Makoto Muramatsu
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Crossref

Shielding effect of underlayer against secondary electrons generated in substrate in extreme ultraviolet lithography

Japanese Journal of Applied Physics
2024-01-01 | Journal article
DOI: 10.35848/1347-4065/ad10ee
Contributors: Takahiro Kozawa
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Crossref

Effects of underlayer absorption coefficient on bridging risk in chemically amplified resist process for extreme ultraviolet lithography

Japanese Journal of Applied Physics
2023-11-01 | Journal article
DOI: 10.35848/1347-4065/ad05ff
Contributors: Takahiro Kozawa
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Crossref

Sensitization of polymethacrylate resist with adding acid-generating promoters upon exposure to EUV light

Japanese Journal of Applied Physics
2023-11-01 | Journal article
DOI: 10.35848/1347-4065/ad0745
Contributors: Kazumasa Okamoto; Akihiro Konda; Yuki Ishimaru; Takahiro Kozawa; Yasunobu Nakagawa; Masamichi Nishimura
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Crossref

Analysis of resist images with pattern defects by Hough transform

Japanese Journal of Applied Physics
2023-08-01 | Journal article
DOI: 10.35848/1347-4065/acea0c
Contributors: Yuqing Jin; Takahiro Kozawa; Kota Aoki; Tomoya Nakamura; Yasushi Makihara; Yasushi Yagi
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Crossref

Defect risks at interfaces of chemically amplified resists in extreme ultraviolet lithography process

Japanese Journal of Applied Physics
2023-07-01 | Journal article
DOI: 10.35848/1347-4065/acde28
Contributors: Takahiro Kozawa
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Crossref

Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and γ-radiolysis

Japanese Journal of Applied Physics
2023-07-01 | Journal article
DOI: 10.35848/1347-4065/ace012
Contributors: Yui Takata; Yusa Muroya; Takahiro Kozawa; Kohei Machida; Satoshi Enomoto; Bilal Naqvi; Danilo De Simone
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Crossref

Classification of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions

Japanese Journal of Applied Physics
2023-06-01 | Journal article
DOI: 10.35848/1347-4065/acd59c
Contributors: Hitomi Betsumiya; Yuqing Jin; Yuko Tsutsui Ito; Takahiro Kozawa; Kazuo Sakamoto; Makoto Muramatsu
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Crossref

Photoresist stochastic defect generation depending on alkyl chain length and concentration of tetraalkylammonium hydroxide in alkali aqueous developer

Japanese Journal of Applied Physics
2023-06-01 | Journal article
DOI: 10.35848/1347-4065/acbcdc
Contributors: Masahiko Harumoto; Andreia Figueiredo dos Santos; Julius Joseph Santillan; Toshiro Itani; Takahiro Kozawa
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Crossref

Dissolution dynamics of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solution

Japanese Journal of Applied Physics
2023-03-01 | Journal article
DOI: 10.35848/1347-4065/acc222
Contributors: Hitomi Betsumiya; Yuko Tsutsui Ito; Takahiro Kozawa; Kazuo Sakamoto; Makoto Muramatsu
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Crossref

Effects of photoacid generator decomposition on dissolution kinetics of poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions

Japanese Journal of Applied Physics
2023-03-01 | Journal article
DOI: 10.35848/1347-4065/acbcb6
Contributors: Yutaro Iwashige; Yuko Tsutsui Ito; Takahiro Kozawa; Kazuo Sakamoto; Makoto Muramatsu
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Crossref

Protected unit distribution near interfaces of chemically amplified resists used for extreme ultraviolet lithography

Japanese Journal of Applied Physics
2023-01-01 | Journal article
DOI: 10.35848/1347-4065/acb0b2
Contributors: Takahiro Kozawa
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Crossref

Stochastic defect generation depending on tetraalkylhydroxide aqueous developers in extreme ultraviolet lithography

Japanese Journal of Applied Physics
2023-01-01 | Journal article
DOI: 10.35848/1347-4065/aca9ae
Contributors: Masahiko Harumoto; Andreia Figueiredo dos Santos; Julius Joseph Santillan; Toshiro Itani; Takahiro Kozawa
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Crossref

Interfacial effects on sensitization of chemically amplified extreme ultraviolet resists

Japanese Journal of Applied Physics
2022-11-01 | Journal article
DOI: 10.35848/1347-4065/ac9500
Contributors: Takahiro Kozawa
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Crossref

Theoretical study on defect risks of chemically amplified resists used for extreme ultraviolet lithography

Japanese Journal of Applied Physics
2022-10-01 | Journal article
DOI: 10.35848/1347-4065/ac8dd1
Contributors: Takahiro Kozawa
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Crossref

Electrostatic effect on the dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution

Japanese Journal of Applied Physics
2022-08-01 | Journal article
DOI: 10.35848/1347-4065/ac8034
Contributors: Naoki Tanaka; Takahiro Kozawa; Takuya Ikeda; Yoshitaka Komuro; Daisuke Kawana
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Crossref

Sensitization mechanism of metal oxide nanocluster resists with carboxylic acid ligands

Japanese Journal of Applied Physics
2022-08-01 | Journal article
DOI: 10.35848/1347-4065/ac7dd3
Contributors: Tomoe Otsuka; Yusa Muroya; Takuya Ikeda; Yoshitaka Komuro; Daisuke Kawana; Takahiro Kozawa
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Crossref

Effects of film thickness and alkaline concentration on dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution

Japanese Journal of Applied Physics
2022-06-01 | Journal article
DOI: 10.35848/1347-4065/ac4b08
Contributors: Naoki Tanaka; Kyoko Matsuoka; Takahiro Kozawa; Takuya Ikeda; Yoshitaka Komuro; Daisuke Kawana
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Estimation of effective reaction radius for catalytic chain reaction of chemically amplified resist by Bayesian optimization

Japanese Journal of Applied Physics
2022-06-01 | Journal article
DOI: 10.35848/1347-4065/ac6a36
Contributors: Yuqing Jin; Takahiro Kozawa
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Crossref

Study on deprotonation from radiation-induced ionized acrylate polymers including acid-generation promoters for improving chemically amplified resists

Japanese Journal of Applied Physics
2022-06-01 | Journal article
DOI: 10.35848/1347-4065/ac67ba
Contributors: Kazumasa Okamoto; Akihiro Konda; Yuki Ishimaru; Takahiro Kozawa; Yasunobu Nakagawa; Masamichi Nishimura
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Crossref

Swelling and dissolution kinetics of poly(4-hydroxystyrene) in tetrabutylammonium hydroxide (TBAH) aqueous solutions studied by quartz crystal microbalance (QCM) method—in comparison with tetramethylammonium hydroxide (TMAH) aqueous solutions

Japanese Journal of Applied Physics
2022-06-01 | Journal article
DOI: 10.35848/1347-4065/ac6c11
Contributors: Yuko Tsutsui Ito; Hitomi Betsumiya; Takahiro Kozawa; Kazuo Sakamoto; Makoto Muramatsu
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Crossref

Classification of lines, spaces, and edges of resist patterns in scanning electron microscopy images using unsupervised machine learning

Japanese Journal of Applied Physics
2022-05-01 | Journal article
DOI: 10.35848/1347-4065/ac56b5
Contributors: Yuqing Jin; Takahiro Kozawa
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Crossref

Dependence of photoresist dissolution dynamics in alkaline developers on alkyl chain length of tetraalkylammonium hydroxide

Japanese Journal of Applied Physics
2022-05-01 | Journal article
DOI: 10.35848/1347-4065/ac61f2
Contributors: Masahiko Harumoto; Julius Joseph Santillan; Toshiro Itani; Takahiro Kozawa
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Crossref

Effect of surface free energy of organic underlayer on the dissolution kinetics of poly(4-hydroxystyrene) film in tetramethylammonium hydroxide aqueous developer

Japanese Journal of Applied Physics
2022-05-01 | Journal article
DOI: 10.35848/1347-4065/ac5947
Contributors: Tomoe Otsuka; Yuqing Jin; Naoki Tanaka; Takahiro Kozawa
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Crossref

Decarboxylation efficiency of carboxylic acids as ligands of metal oxide nanocluster resists upon γ-ray irradiation

Japanese Journal of Applied Physics
2022-03-01 | Journal article
DOI: 10.35848/1347-4065/ac4b43
Contributors: Tomoe Otsuka; Yusa Muroya; Takuya Ikeda; Yoshitaka Komuro; Daisuke Kawana; Takahiro Kozawa
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Crossref

Formulation of trade-off relationships between resolution, line edge roughness, and sensitivity in sub-10 nm half-pitch region for chemically amplified extreme ultraviolet resists

Japanese Journal of Applied Physics
2022-01-01 | Journal article
DOI: 10.35848/1347-4065/ac3ea7
Contributors: Takahiro Kozawa
Source: check_circle
Crossref

Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution

Japanese Journal of Applied Physics
2022-01-01 | Journal article
DOI: 10.35848/1347-4065/ac3d42
Contributors: Yuko Tsutsui Ito; Takahiro Kozawa
Source: check_circle
Crossref

Relationship between blurring factors and interfacial effects in chemically amplified resist processes in photomask fabrication

Japanese Journal of Applied Physics
2021-12-01 | Journal article
DOI: 10.35848/1347-4065/ac33cd
Contributors: Takahiro Kozawa; Takao Tamura
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Crossref

Theoretical study of interfacial effects on low-energy electron dynamics in chemically amplified resist processes of photomask fabrication

Japanese Journal of Applied Physics
2021-08-01 | Journal article
DOI: 10.35848/1347-4065/ac1644
Contributors: Takahiro Kozawa; Takao Tamura
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Crossref

Analysis of mitigating factors for line edge roughness generated during electron beam lithography using machine learning

Japanese Journal of Applied Physics
2021-07-01 | Journal article
DOI: 10.35848/1347-4065/ac0d13
Contributors: Yuqing Jin; Takahiro Kozawa; Takao Tamura
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Crossref

Study on radical dianions of carboxylates used as ligands of metal oxide nanocluster resists

Japanese Journal of Applied Physics
2021-07-01 | Journal article
DOI: 10.35848/1347-4065/ac06db
Contributors: Kengo Ikeuchi; Yusa Muroya; Takuya Ikeda; Yoshitaka Komuro; Daisuke Kawana; Takahiro Kozawa
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Crossref
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