Personal information

Japan

Activities

Employment (2)

Nihon Gakujutsu Shinkokai: Chiyoda-ku, Tokyo, JP

2015-04-01 to present | JSPS Research Fellow (PD) (Advanced Institute for Materials Research, Tohoku University)
Employment
Source: Self-asserted source
Issei Sugiyama

Nihon Gakujutsu Shinkokai: Chiyoda-ku, Tokyo, JP

2012-04-01 to 2015-03-31 | JSPS Research Fellow (DC1) (Materials Engineering, The University of Tokyo)
Employment
Source: Self-asserted source
Issei Sugiyama

Education and qualifications (3)

The University of Tokyo: Tokyo, JP

2012-04-01 to 2015-03-31 | Ph. D. (Materials Engineering)
Education
Source: Self-asserted source
Issei Sugiyama

The University of Tokyo: Tokyo, JP

2010-04-01 to 2012-03-31 | Master (Advanced Materials Science)
Education
Source: Self-asserted source
Issei Sugiyama

The University of Tokyo: Tokyo, JP

2006-04-01 to 2010-03-31 | Bachelor (Materials Engineering)
Education
Source: Self-asserted source
Issei Sugiyama

Funding (3)

JSPS PD

2015-04 to 2018-03 | Grant
JSPS (Tokyo, JP)
Source: Self-asserted source
Issei Sugiyama

Fujisankei business i Advanced Technology Award, Nippon Broadcasting Prize

2014-07 to 2014-07 | Award
Fujisankei business i (Tokyo, JP)
Source: Self-asserted source
Issei Sugiyama

JSPS Research Fellow (DC1)

2012-04 to 2015-03 | Grant
JSPS (Tokyo, JP)
Source: Self-asserted source
Issei Sugiyama

Works (10)

Pulsed laser deposition of oxide thin films by the fifth harmonic of a Nd:Y3Al5O12 (Nd:YAG) laser

AIP Advances
2018-09 | Journal article
Contributors: Ryota Shimizu; Issei Sugiyama; Naoto Nakamura; Shigeru Kobayashi; Taro Hitosugi
Source: check_circle
Crossref

Fabrication of atomically abrupt interfaces of single-phase TiH2 and Al2O3

APL Materials
2017-08-01 | Journal article
Contributors: Ryota Shimizu; Yuki Sasahara; Hiroyuki Oguchi; Kuniko Yamamoto; Issei Sugiyama; Susumu Shiraki; Shin-ichi Orimo; Taro Hitosugi
Source: check_circle
Crossref

A nonvolatile memory device with very low power consumption based on the switching of a standard electrode potential

APL Materials
2017-04 | Journal article
Contributors: Issei Sugiyama; Ryota Shimizu; Tohru Suzuki; Kuniko Yamamoto; Hideyuki Kawasoko; Susumu Shiraki; Taro Hitosugi
Source: check_circle
Crossref

Determination of Space-Charge-Layer Width in Li-Ion Solid Electrolyte Under the Application of Voltages

ECS Meeting Abstracts
2016-09-01 | Journal article
Contributors: Issei Sugiyama; Masahiro Saito; Yasuhito Aoki; Yuji Otsuka; Ryota Shimizu; Taro Hitosugi
Source: check_circle
Crossref

Carbon content dependence of grain growth mode in VC-doped WC-Co hardmetals

International Journal of Refractory Metals & Hard Materials
2015 | Journal article
WOSUID:

WOS:000358625500035

Contributors: Sugiyama, I.; Mizumukai, Y.; Taniuchi, T.; Okada, K.; Shirase, F.; Tanase, T.; Ikuhara, Y.; Yamamoto, T.
Source: Self-asserted source
Issei Sugiyama via ResearcherID

Spatially-resolved mapping of history-dependent coupled electrochemical and electronical behaviors of electroresistive NiO

Scientific Reports
2014 | Journal article
DOI:

10.1038/srep06725

WOSUID:

WOS:000343595900001

Contributors: Sugiyama, Issei; Kim, Yunseok; Jesse, Stephen; Strelcov, Evgheni; Kumar, Amit; Tselev, Alexander; Rahani, Ehasan Kabiri; Shenoy, Vivek B.; Yamamoto, Takahisa; Shibata, Naoya et al.
Source: Self-asserted source
Issei Sugiyama via ResearcherID

Ferromagnetic dislocations in antiferromagnetic NiO

Nature Nanotechnology
2013 | Journal article
DOI:

10.1038/nnano.2013.45

WOSUID:

WOS:000317046800013

Contributors: Sugiyama, Issei; Shibata, Naoya; Wang, Zhongchang; Kobayashi, Shunsuke; Yamamoto, Takahisa; Ikuhara, Yuichi
Source: Self-asserted source
Issei Sugiyama via ResearcherID

Three-dimensional morphology of (W,V)C-x in VC-doped WC-Co hard metals

Scripta Materialia
2013 | Journal article
DOI:

10.1016/j.scriptamat.2013.06.002

WOSUID:

WOS:000322428300011

Contributors: Sugiyama, I.; Mizumukai, Y.; Taniuchi, T.; Okada, K.; Shirase, F.; Tanase, T.; Ikuhara, Y.; Yamamoto, T.
Source: Self-asserted source
Issei Sugiyama via ResearcherID

Formation of (W,V)C-x layers at the WC/Co interfaces in the VC-doped WC-Co cemented carbide

International Journal of Refractory Metals & Hard Materials
2012 | Journal article
DOI:

10.1016/j.ijrmhm.2011.08.006

WOSUID:

WOS:000296688400031

Contributors: Sugiyama, I.; Mizumukai, Y.; Taniuchi, T.; Okada, K.; Shirase, F.; Tanase, T.; Ikuhara, Y.; Yamamoto, T.
Source: Self-asserted source
Issei Sugiyama via ResearcherID

Blunt corners of WC grains induced by lowering carbon content in WC-12mass%Co cemented carbides

Journal of Materials Science
2011 | Journal article
DOI:

10.1007/s10853-010-5076-1

WOSUID:

WOS:000288962200041

Contributors: Sugiyama, I.; Goto, M.; Taniuchi, T.; Shirase, F.; Tanase, T.; Okada, K.; Ikuhara, Y.; Yamamoto, T.
Source: Self-asserted source
Issei Sugiyama via ResearcherID