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ferroelectric memory
Taiwan

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Performance investigation of hafnium-oxide negative capacitance transistor with remote nitrogen plasma treatment

Thin Solid Films
2022-08 | Journal article
Contributors: Zhong-Ying Huang; Hsuan-Han Chen; Ruo-Yin Liao; Hsiao-Hsuan Hsu; Kuan-Hsiang Lin; Wei-Ting Chen; Shih-Hao Lin; Ching-Chien Huang; Wu-Ching Chou; Chun-Hu Cheng
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