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Works (6)

Role of Molecular Orientation: Comparison of Nitrogenous Aromatic Small Molecule Inhibitors for Area-Selective Atomic Layer Deposition

Chemistry of Materials
2025-01-14 | Journal article
Contributors: Alexander Shearer; Fabian Pieck; Josiah Yarbrough; Andreas Werbrouck; Ralf Tonner-Zech; Stacey F. Bent
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Crystalline 1D Coordination Polymer Inhibitor Layer Leads to Vertical Sidewalls in Selectively Deposited ZnO on Nanoscale Patterns

2024-12-12 | Preprint
Contributors: Alexander Shearer; Yukio Cho; Miso Kim; Andreas Werbrouck; Tzu-Ling Liu; Chris Takacs; Bonggeun Shong; Stacey F Bent
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The Impact of ALD Precursor Choice on Nucleation and Growth of Dielectrics on 2D Materials

ECS Meeting Abstracts
2024-08-09 | Journal article
Contributors: Alexander Shearer; Jung-Soo Ko; Krishna C. Saraswat; Eric Pop; Stacey F. Bent
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HfO2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer

Chemistry of Materials
2024-05-14 | Journal article
Contributors: Yujin Lee; Seunggi Seo; Alexander B. Shearer; Andreas Werbrouck; Hyungjun Kim; Stacey F. Bent
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Area-Selective Atomic Layer Deposition of Al2O3 with a Methanesulfonic Acid Inhibitor

Chemistry of Materials
2023-08-08 | Journal article
Contributors: Josiah Yarbrough; Fabian Pieck; Alexander B. Shearer; Patrick Maue; Ralf Tonner-Zech; Stacey F. Bent
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Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition

Journal of Vacuum Science & Technology A
2021-03-01 | Journal article
Contributors: Josiah Yarbrough; Alex B. Shearer; Stacey F. Bent
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