Biography

Kiyoteru Kobayashi received the B.E. and M.E. degrees in Applied Physics, and the Doctor of Engineering, all from Nagoya University, Nagoya, Japan, in 1981, 1983, and 1997, respectively.
In 1983, he joined Mitsubishi Electric Corporation, Hyogo, Japan. He studied and developed thin film formation technologies including low-pressure chemical vapor deposition and thermal oxidation of silicon there. He also studied the mechanisms of dielectric breakdown and charge trapping of SiO2 and Si3N4 thin films for applications in semiconductor memories and SoC devices. He was also engaged research and development on high-density flash memory.
In 2003, he joined Renesas Technology Corporation and served as a Manager of Back-End Thin Film Technology Development Group, where he developed STI, salicide and interconnect technologies for advanced CMOS devices.
In 2005, he joined Tokai University, Kanagawa, Japan, as a Full-time Professor. During 2019 to 2022, he served as the Chairperson of the Department of Electrical and Electronic Engineering, School of Engineering, there. He was engaged studies on experimental characterization of point defects and modeling of the charge trapping phenomena in dielectric thin films for nonvolatile memory applications. He served as the supervisor of 27 graduate students.
In 2024, he jointed ESCO, Ltd., Tokyo, JAPAN. His current research activities include thin film analysis using thermal desorption spectroscopy (TDS).
He is the author and co-author of approximately 100 articles in journals and conferences. He is the author of a textbook on Semiconductor Device Engineering for Integrated Circuits and is also the author of two book chapters in his field of expertise.
He served as the Principal Investigator and obtained the Grants-in-Aid for Scientific Research in Japan 3 times during 2009 to 2012, 2014 to 2017 and 2018 to 2021.
Dr. Kobayashi has served as the Chairperson of the Technical Program Committee of the Symposium on Semiconductors and Integrated Circuits Technology during 2017 to 2022. During 2019 to 2020, he was an organizer of Nonvolatile Memories and Artificial Neural Networks Symposium of the Electrochemical Society Meeting (ECS Meeting). During 2011 to 2017, he was an organizer of Nonvolatile Memories Symposiums of the ECS Meetings. He was an International Technical Program Committee member of the International Symposium on Control of Semiconductor Interfaces (ISCSI) during 2012 to 2013, 2015 to 2016, and 2021 to 2022.
He is currently the Vice-Chairperson of the Electronic Materials Committee of the Electrochemical Society of Japan. He is also a member of the Japan Society of Applied Physics and a member of the Institute of Electronics, Information and Communication Engineers.