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Works (3)

Characteristics of an Amorphous Carbon Layer as a Diffusion Barrier for an Advanced Copper Interconnect

ACS Applied Materials & Interfaces
2020-01-15 | Journal article
DOI: 10.1021/acsami.9b15562
Contributors: Byeong-Seon An; Yena Kwon; Jin-Su Oh; Changmin Lee; Seongheum Choi; Hyoungsub Kim; Miji Lee; Sangwoo Pae; Cheol-Woong Yang
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Electrical properties of the HfO2/Al2O3 dielectrics stacked using single- and dual-temperature atomic-layer deposition processes on In0.53Ga0.47As

Semiconductor Science and Technology
2019-10-01 | Journal article
DOI: 10.1088/1361-6641/ab3bec
Contributors: Changmin Lee; Sungho Choi; Youngseo An; Byeong-Seon An; Woohui Lee; Wan Oh; Deokjoon Eom; Jehoon Lee; Cheol-Woong Yang; Hyoungsub Kim
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Shallow doping effect of ZnO treatment using atomic layer deposition process on p-type In0.53Ga0.47As

Journal of Physics D: Applied Physics
2018-06-20 | Journal article
DOI: 10.1088/1361-6463/aac374
Part of ISSN: 0022-3727
Part of ISSN: 1361-6463
Source: Self-asserted source
Changmin Lee
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