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Employment (4)

University of Missouri: Columbia, US

2023-09-01 to present | Postdoctoral Scholar (Chemical Engineering)
Employment
Source: Self-asserted source
Andreas Werbrouck

Stanford University: Stanford, US

2021-09-01 to 2023-08-31 | Postdoctoral Scholar (Chemical Engineering)
Employment
Source: Self-asserted source
Andreas Werbrouck

Ghent University: Ghent, BE

2021-06-01 to 2021-08-31 | Postdoctoral Scholar (Solid State Sciences)
Employment
Source: Self-asserted source
Andreas Werbrouck

Ghent University: Ghent, BE

2016-09-01 to 2021-06-01 | PhD Student (Solid State Sciences)
Employment
Source: Self-asserted source
Andreas Werbrouck

Works (20)

Deposition and Degradation Mechanism of Zinc Thiolate Thin Films via Hybrid Molecular Layer Deposition

Chemistry of Materials
2025-02-06 | Journal article
Contributors: Jacqueline Lewis; Jingwei Shi; Andreas Werbrouck; Stacey F. Bent
Source: check_circle
Crossref

Enhanced ALD Nucleation on Polymeric Separator for Improved Li–S Batteries

ACS Applied Materials & Interfaces
2025-01-29 | Journal article
Contributors: Giulio D’Acunto; Sanzeeda Baig Shuchi; Xueli Zheng; Long Viet Than; Eva M. Geierstanger; Maggy Harake; Andy Cui; Andreas Werbrouck; Miika Mattinen; Yi Cui et al.
Source: check_circle
Crossref

Role of Molecular Orientation: Comparison of Nitrogenous Aromatic Small Molecule Inhibitors for Area-Selective Atomic Layer Deposition

Chemistry of Materials
2025-01-14 | Journal article
Contributors: Alexander Shearer; Fabian Pieck; Josiah Yarbrough; Andreas Werbrouck; Ralf Tonner-Zech; Stacey F. Bent
Source: check_circle
Crossref

Enhanced Growth in Atomic Layer Deposition of Ruthenium Metal: The Role of Surface Diffusion and Nucleation Sites

Chemistry of Materials
2024 | Journal article
EID:

2-s2.0-85181814699

Part of ISSN: 15205002 08974756
Contributors: Rothman, A.; Werbrouck, A.; Bent, S.F.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier

HfO<sub>2</sub> Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer

Chemistry of Materials
2024 | Journal article
EID:

2-s2.0-85190743346

Part of ISSN: 15205002 08974756
Contributors: Lee, Y.; Seo, S.; Shearer, A.B.; Werbrouck, A.; Kim, H.; Bent, S.F.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier
grade
Preferred source (of 2)‎

Molecular layer deposition of polyhydroquinone thin films for Li‐ion battery applications

AIChE Journal
2024-12 | Journal article
Contributors: Nikhila C. Paranamana; Amit K. Datta; Quinton K. Wyatt; Ryan C. Gettler; Andreas Werbrouck; Matthias J. Young
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Crossref
grade
Preferred source (of 2)‎

Understanding Cathode–Electrolyte Interphase Formation in Solid State Li‐Ion Batteries via 4D‐STEM

Advanced Energy Materials
2024-12-23 | Journal article
Contributors: Nikhila C. Paranamana; Andreas Werbrouck; Amit K. Datta; Xiaoqing He; Matthias J. Young
Source: check_circle
Crossref

Crystalline 1D Coordination Polymer Inhibitor Layer Leads to Vertical Sidewalls in Selectively Deposited ZnO on Nanoscale Patterns

2024-12-12 | Preprint
Contributors: Alexander Shearer; Yukio Cho; Miso Kim; Andreas Werbrouck; Tzu-Ling Liu; Chris Takacs; Bonggeun Shong; Stacey F Bent
Source: check_circle
Crossref

Comparison of Al- and Hf-based hybrid photoresists grown by molecular layer deposition for extreme ultraviolet lithography

Journal of Vacuum Science & Technology A
2024-12-01 | Journal article
Contributors: Ajay Ravi; Long Viet Than; Jacqueline Lewis; Jingwei Shi; Andreas Werbrouck; Jingyi Han; Miika Mattinen; Stacey F. Bent
Source: check_circle
Crossref
grade
Preferred source (of 2)‎

Atomic Layer Deposition for Stable InP-Based On-Chip Quantum Dot microLEDs: Hybrid Quantum Dot Pockets

ACS Applied Materials & Interfaces
2024-11-20 | Journal article
Contributors: Robin R. Petit; Resul Ozdemir; Hannes Van Avermaet; Luca Giordano; Jakob Kuhs; Andreas Werbrouck; Matthias Filez; Jolien Dendooven; Zeger Hens; Philippe F. Smet et al.
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Crossref
grade
Preferred source (of 2)‎

Atomic layer deposition of metal phosphates

Applied Physics Reviews
2022 | Journal article
EID:

2-s2.0-85126392100

Part of ISSN: 19319401
Contributors: Henderick, L.; Dhara, A.; Werbrouck, A.; Dendooven, J.; Detavernier, C.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier

Atomic Layer Deposition of Ruthenium Dioxide Based on Redox Reactions between Alcohols and Ruthenium Tetroxide

Chemistry of Materials
2022 | Journal article
EID:

2-s2.0-85139129849

Part of ISSN: 15205002 08974756
Contributors: Poonkottil, N.; Minjauw, M.M.; Werbrouck, A.; Checchia, S.; Solano, E.; Nisula, M.; Franquet, A.; Detavernier, C.; Dendooven, J.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier
grade
Preferred source (of 2)‎

Selective Vapor-Phase Doping of Pt Nanoparticles into Phase-Controlled Nanoalloys

Journal of Physical Chemistry C
2022 | Journal article
EID:

2-s2.0-85123361224

Part of ISSN: 19327455 19327447
Contributors: Poonkottil, N.; Ramachandran, R.K.; Solano, E.; Srinath, N.V.; Feng, J.-Y.; Werbrouck, A.; Van Daele, M.; Filez, M.; Minjauw, M.M.; Poelman, H. et al.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier
grade
Preferred source (of 2)‎

Surface reactions between LiHMDS, TMA and TMP leading to deposition of amorphous lithium phosphate

Journal of Materials Chemistry A
2022 | Journal article
EID:

2-s2.0-85124963845

Part of ISSN: 20507496 20507488
Contributors: Werbrouck, A.; Mattelaer, F.; Dhara, A.; Nisula, M.; Minjauw, M.; Munnik, F.; Dendooven, J.; Detavernier, C.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier
grade
Preferred source (of 2)‎

Converting molecular layer deposited alucone films into Al<sub>2</sub>O<sub>3</sub>/alucone hybrid multilayers by plasma densification

Dalton Transactions
2021 | Journal article
EID:

2-s2.0-85100429355

Part of ISSN: 14779234 14779226
Contributors: Santo Domingo Peñaranda, J.; Nisula, M.; Vandenbroucke, S.S.T.; Minjauw, M.M.; Li, J.; Werbrouck, A.; Keukelier, J.; Pitillas Martínez, A.I.; Dendooven, J.; Detavernier, C.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier

Plasma-enhanced atomic layer deposition: Correlating O<sub>2</sub> plasma parameters and species to blister formation and conformal film growth

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
2021 | Journal article
EID:

2-s2.0-85115205495

Part of ISSN: 15208559 07342101
Contributors: Werbrouck, A.; Van de Kerckhove, K.; Depla, D.; Poelman, D.; Smet, P.F.; Dendooven, J.; Detavernier, C.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier
grade
Preferred source (of 3)‎

A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with Trimethylaluminum and Water, Revealed by Full-Range, Time-Resolved in Situ Mass Spectrometry

Journal of Physical Chemistry C
2020 | Journal article
EID:

2-s2.0-85097765489

Part of ISSN: 19327455 19327447
Contributors: Werbrouck, A.; Shirazi, M.; Mattelaer, F.; Elliott, S.D.; Dendooven, J.; Detavernier, C.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier
grade
Preferred source (of 2)‎

Reaction pathways for atomic layer deposition with lithium hexamethyl disilazide, trimethyl phosphate, and oxygen plasma

Journal of Physical Chemistry C
2020 | Journal article
EID:

2-s2.0-85097744206

Part of ISSN: 19327455 19327447
Contributors: Werbrouck, A.; Mattelaer, F.; Minjauw, M.; Nisula, M.; Julin, J.; Munnik, F.; Dendooven, J.; Detavernier, C.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier
grade
Preferred source (of 2)‎

Atomic layer deposition of ZnO–SnO<sub>2</sub> composite thin film: The influence of structure, composition and crystallinity on lithium-ion battery performance

Electrochimica Acta
2019 | Journal article
EID:

2-s2.0-85070016332

Part of ISSN: 00134686
Contributors: Zhao, B.; Mattelaer, F.; Kint, J.; Werbrouck, A.; Henderick, L.; Minjauw, M.; Dendooven, J.; Detavernier, C.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier

In Situ Photoluminescence of Colloidal Quantum Dots during Gas Exposure - The Role of Water and Reactive Atomic Layer Deposition Precursors

ACS Applied Materials and Interfaces
2019 | Journal article
EID:

2-s2.0-85070485304

Part of ISSN: 19448252 19448244
Contributors: Kuhs, J.; Werbrouck, A.; Zawacka, N.; Drijvers, E.; Smet, P.F.; Hens, Z.; Detavernier, C.
Source: Self-asserted source
Andreas Werbrouck via Scopus - Elsevier

Peer review (5 reviews for 4 publications/grants)

Review activity for Chemistry of materials. (1)
Review activity for Journal of physical chemistry. (1)
Review activity for Journal of vacuum science & technology. (2)
Review activity for Nature communications (1)