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Activities

Employment (3)

3D-Oxides: Saint-Genis-Pouilly, Ain, FR

2009-11-09 to present | Engineer R&D (R&D)
Employment
Source: Self-asserted source
Estelle Wagner

ABCD Technology: Nyon, Vaud, CH

2006 to 2009 | Engineer R&D (R&D)
Employment
Source: Self-asserted source
Estelle Wagner

Ecole Polytechnique Fésérale de Lausanne: Lausanne, Vaud, CH

1998-04-01 to 2004-03-31 | Research assistant (Applied Optics Institute)
Employment
Source: Self-asserted source
Estelle Wagner

Education and qualifications (3)

École Polytechnique Fédérale de Lausanne: Lausanne, VD, CH

1998-04 to 2002-09 | PhD Student (Microtechnics)
Qualification
Source: Self-asserted source
Estelle Wagner

École Nationale Supérieure de Chimie de Montpellier: Montpellier, FR

1994-09 to 1997-10 | Ingénieur
Education
Source: Self-asserted source
Estelle Wagner

University of Kent: Canterbury, GB

1996-09 to 1997-08 | Master of Chemistry
Education
Source: Self-asserted source
Estelle Wagner

Works (34)

Empowering TiO2:ZrO2 composite for energy storage through chemical beam vapor deposition

Thin Solid Films
2025-04 | Journal article
Contributors: Md Kashif Shamim; William Maudez; Estelle Wagner; Seema Sharma; Radheshyam Rai; Giacomo Benvenuti; Rashmi Rani
Source: check_circle
Crossref

HfO₂ Thin Films by Chemical Beam Vapor Deposition for Large Resistive Switching Memristors

IEEE Journal of the Electron Devices Society
2024 | Journal article
Contributors: Federico Vittorio Lupo; Mauro Mosca; Sarunas Bagdzevicius; Rashmi Rani; William Maudez; Estelle Wagner; Maria Pia Casaletto; Salvatore Basile; Giacomo Benvenuti; Isodiana Crupi et al.
Source: check_circle
Crossref

Growth of Low-Temperature Epitaxial Lithium Niobate Thin Films and Guided-Wave Optical Properties

Photonics
2024-09-24 | Journal article
Contributors: Thanh Ngoc Kim Bui; Estelle Wagner; Rahma Moalla; William Maudez; Karim Dogheche; Romain Bachelet; Bruno Masenelli; Giacomo Benvenuti; Denis Rémiens; El Hadj Dogheche
Source: check_circle
Crossref
grade
Preferred source (of 2)‎

Doping-induced Ti3+ state and oxygen vacancies in TiO2: A single-chip combinatorial investigation

Materials Chemistry and Physics
2023-10 | Journal article
Part of ISSN: 0254-0584
Contributors: Raja Elrahoumi; Liangchen Zhu; Estelle Wagner; William Maudez; Giacomo Benvenuti; Matthew R. Phillips; Cuong Ton-That
Source: Self-asserted source
Estelle Wagner

Structural and dielectric investigation of thermal treated TiO2/ZrO2 composite thin films grown by chemical beam vapor deposition

Thin Solid Films
2023-08 | Journal article
Part of ISSN: 0040-6090
Contributors: Rashmi Rani; Md Kashif Shamim; William Maudez; Estelle Wagner; Radheshyam Rai; Seema Sharma; Giacomo Benvenuti
Source: Self-asserted source
Estelle Wagner

Efficient Optimization of High‐Quality Epitaxial Lithium Niobate Thin Films by Chemical Beam Vapor Deposition: Impact of Cationic Stoichiometry

Advanced Materials Interfaces
2023-08-30 | Journal article
Part of ISSN: 2196-7350
Part of ISSN: 2196-7350
Contributors: Anna L. Pellegrino; Estelle Wagner; Francesca Lo Presti; William Maudez; Simon Kolb; Rashmi Rani; Antoine Bernard; Stephan Guy; Alban Gassenq; Marina Raevskaia et al.
Source: Self-asserted source
Estelle Wagner

CBVD grown HfO2 on TiN for high-precision MIM capacitor

Physica B: Condensed Matter
2023-02 | Journal article
Contributors: Rashmi Rani; William Maudez; Rajat Sayal; Radheshyam Rai; Sanjeev Kumar; Md Kashif Shamim; Estelle Wagner; Seema Sharma; Giacomo Benvenuti
Source: check_circle
Crossref

Widely Tuneable Composition and Crystallinity of Graded Na<sub>1+x</sub>TaO<sub>3&plusmn;&delta;</sub> Thin Films Fabricated by Chemical Beam Vapor Deposition

Nanomaterials
2022-03 | Journal article | Author
Contributors: Corrado Garlisi; Petru Lunca Popa; Kevin Menguelti; Vincent Rogé; Marc Michel; Christèle Vergne; Jérôme Guillot; Estelle Wagner; William Maudez; Giacomo Benvenuti et al.
Source: check_circle
Multidisciplinary Digital Publishing Institute
grade
Preferred source (of 2)‎

Study of titanium amino-alkoxide derivatives as TiO2 Chemical Beam Vapour Deposition precursor

Materials Chemistry and Physics
2022-02 | Journal article
Part of ISSN: 0254-0584
Contributors: Diane Bijou; Estelle Wagner; William Maudez; Thibaut Cornier; Mohamed Karim YETTOU; Giacomo Benvenuti; Stéphane Daniele
Source: Self-asserted source
Estelle Wagner

Chemical beam vapour deposition technique with Sybilla equipment: review of main results in its 20-year anniversary

Oxide-based Materials and Devices XII
2021-03-05 | Conference paper
Contributors: Estelle Wagner; William Maudez; Sarunas Bagdzevicius; Silviu Cosmin Sandu; Giacomo Benvenuti
Source: Self-asserted source
Estelle Wagner

Selective area deposition of titanium dioxide thin films by light induced chemical vapour deposition

Le Journal de Physique IV
2001-08 | Journal article
Part of ISSN: 1155-4339
Contributors: E. Halary-Wagner; P. Lambelet; G. Benvenuti; P. Hoffmann
Source: Self-asserted source
Estelle Wagner

Crystallinity of titania thin films deposited by light induced chemical vapor deposition

Applied Surface Science
2000-12 | Journal article
Part of ISSN: 0169-4332
Contributors: E. Halary; E. Haro-Poniatowski; G. Benvenuti; P. Hoffmann
Source: Self-asserted source
Estelle Wagner

Light induced chemical vapour deposition of titanium oxide thin films at room temperature

Applied Surface Science
2000-02 | Journal article
Part of ISSN: 0169-4332
Contributors: E Halary; G Benvenuti; F Wagner; P Hoffmann
Source: Self-asserted source
Estelle Wagner

A combinatorial chemical beam vapour deposition approach to tune the electrical conductivity of Nb:TiO2 films via Si co-doping

THIN SOLID FILMS
Journal article
Part of ISSN: {0040-6090}
Source: Self-asserted source
Estelle Wagner

Amorphous Silicon-Doped Titania Films for on-Chip Photonics

ACS PHOTONICS
Journal article
Part of ISSN: {2330-4022}
Source: Self-asserted source
Estelle Wagner

Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

CHEMPHYSCHEM
Journal article
Part of ISSN: {1439-4235}
Part of ISSN: {1439-7641}
Source: Self-asserted source
Estelle Wagner

Combinatorial Chemical Beam Epitaxy of Lithium Niobate Thin Films on Sapphire

JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Journal article
Part of ISSN: {0013-4651}
Part of ISSN: {1945-7111}
Source: Self-asserted source
Estelle Wagner

Combinatorial Chemical Vapor Deposition of Lithium Niobate Thin Films

EUROCVD 17 / CVD 17
Conference paper
Part of ISSN: {1938-5862}
Source: Self-asserted source
Estelle Wagner

Combinatorial Discovery and Optimization of Amorphous HfO2-Nb2O5 Mixture with Improved Transparency

ELECTROCHEMICAL AND SOLID STATE LETTERS
Journal article
Part of ISSN: {1099-0062}
Source: Self-asserted source
Estelle Wagner

Combinatorial High-Vacuum Chemical Vapor Deposition of Textured Hafnium-Doped Lithium Niobate Thin Films on Sapphire

CRYSTAL GROWTH & DESIGN
Journal article
Part of ISSN: {1528-7483}
Source: Self-asserted source
Estelle Wagner

Efficient optimization of high vacuum chemical vapor deposition of niobium oxide on full wafer scale

FUNDAMENTALS AND TECHNOLOGY OF MULTIFUNCTIONAL OXIDE THIN FILMS (SYMPOSIUM G, EMRS 2009 SPRING MEETING)
Conference paper
Part of ISSN: {1757-8981}
Source: Self-asserted source
Estelle Wagner

Evaluation of niobium dimethylamino-ethoxide for chemical vapour deposition of niobium oxide thin films

THIN SOLID FILMS
Journal article
Part of ISSN: {0040-6090}
Source: Self-asserted source
Estelle Wagner

Fabrication of complex oxide microstructures by combinatorial chemical beam vapour deposition through stencil masks

THIN SOLID FILMS
Journal article
Part of ISSN: {0040-6090}
Source: Self-asserted source
Estelle Wagner

Full wafer metrology for chemically graded thin films

OPTICAL MICRO- AND NANOMETROLOGY IV
Conference paper
Part of ISBN: {978-0-8194-9122-0}
Part of ISSN: {0277-786X}
Source: Self-asserted source
Estelle Wagner

Geometry of Chemical Beam Vapor Deposition System for Efficient Combinatorial Investigations of Thin Oxide Films: Deposited Film Properties versus Precursor Flow Simulations

ACS COMBINATORIAL SCIENCE
Journal article
Part of ISSN: {2156-8952}
Part of ISSN: {2156-8944}
Source: Self-asserted source
Estelle Wagner

High uniformity deposition with chemical beams in high vacuum

THIN SOLID FILMS
Journal article
Part of ISSN: {0040-6090}
Part of ISSN: {1879-2731}
Source: Self-asserted source
Estelle Wagner

Light-induced chemical vapour deposition painting with titanium dioxide

APPLIED SURFACE SCIENCE
Journal article
Part of ISSN: {0169-4332}
Source: Self-asserted source
Estelle Wagner

Light-induced CVD of titanium dioxide thin films I: Kinetics of deposition

CHEMICAL VAPOR DEPOSITION
Journal article
Part of ISSN: {0948-1907}
Part of ISSN: {1521-3862}
Source: Self-asserted source
Estelle Wagner

Light-induced CVD of titanium dioxide thin films II: Thin film crystallinity

CHEMICAL VAPOR DEPOSITION
Journal article
Part of ISSN: {0948-1907}
Part of ISSN: {1521-3862}
Source: Self-asserted source
Estelle Wagner

Resist-free patterned deposition of titanium dioxide thin films by light-induced chemical vapour deposition

MICROELECTRONIC ENGINEERING
Journal article
Part of ISSN: {0167-9317}
Part of ISSN: {1873-5568}
Source: Self-asserted source
Estelle Wagner

Selective area deposition of titanium dioxide thin films by light induced chemical vapour deposition

JOURNAL DE PHYSIQUE IV
Journal article
Part of ISSN: {1155-4339}
Source: Self-asserted source
Estelle Wagner

TiO(2) Laser and Electron Beam Assisted Chemical Deposition

FUNDAMENTALS AND TECHNOLOGY OF MULTIFUNCTIONAL OXIDE THIN FILMS (SYMPOSIUM G, EMRS 2009 SPRING MEETING)
Conference paper
Part of ISSN: {1757-8981}
Source: Self-asserted source
Estelle Wagner

Titanium dioxide thin-film deposition on polymer substrate by light induced chemical vapor deposition

JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Journal article
Part of ISSN: {0013-4651}
Part of ISSN: {1945-7111}
Source: Self-asserted source
Estelle Wagner

Water wetting transition parameters of perfluorinated substrates with periodically distributed flat-top microscale obstacles

LANGMUIR
Journal article
Part of ISSN: {0743-7463}
Source: Self-asserted source
Estelle Wagner