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Works (3)

Plasma-enhanced atomic layer deposition of nickel and nickel oxide on silicon for photoelectrochemical applications

Journal of Physics D: Applied Physics
2023-10-12 | Journal article
Contributors: S O’Donnell; D O’Neill; K Shiel; M Snelgrove; F Jose; C McFeely; R O’Connor
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Growth chemistry of cobalt nitride by plasma enhanced atomic layer deposition

Materials Research Express
2022-10-01 | Journal article
Contributors: S O’Donnell; M Snelgrove; K Shiel; C Weiland; G Hughes; J Woicik; D O’Neill; F Jose; C McFeely; R O’Connor
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Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance

Journal of Physics D: Applied Physics
2022-02-24 | Journal article
Contributors: S O’Donnell; F Jose; K Shiel; M Snelgrove; C McFeely; E McGill; R O’Connor
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