Personal information
Activities
Employment (4)
2022-07
to
present
|
Sr. Scientist
(Advanced Optical Technology)
Employment
Source:
Saurabh Srivastava
2022-02
to
2022-07
|
Research Fellow
(Materials Science and Engineering)
Employment
Source:
Saurabh Srivastava
2017-03
to
2021-12
|
Sr. Postdoctoral Associate
(Low Energy Electronic Systems)
Employment
Source:
Saurabh Srivastava
2016-06
to
2017-03
|
Postdoctoral Associate
(Chemistry (Nanotechnology))
Employment
Source:
Saurabh Srivastava
Education and qualifications (2)
2011-09
to
2016-05
|
Ph.D.
(Chemistry (Nanotechnology))
Education
Source:
Saurabh Srivastava
2009-07
to
2011-06
|
Master of Technology
(Materials Science and Engineering)
Education
Source:
Saurabh Srivastava
Works (14)
ACS Applied Materials & Interfaces
2022-11-02
|
Journal article
Contributors:
Saurabh Srivastava;
Kenneth E. Lee;
Eugene A. Fitzgerald;
Stephen J. Pennycook;
Silvija Gradečak
Source:
check_circle
Crossref
ACS Applied Materials and Interfaces
2021
|
Journal article
EID:
2-s2.0-85115100386
Contributors:
Srivastava, S.;
Thomas, J.P.;
Guan, X.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
ACS Applied Materials and Interfaces
2020
|
Journal article
EID:
2-s2.0-85094931067
Contributors:
Guan, X.;
Srivastava, S.;
Thomas, J.P.;
Heinig, N.F.;
Kang, J.-S.;
Rahman, M.A.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
Nanoscale
2019
|
Journal article
EID:
2-s2.0-85073125882
Contributors:
Srivastava, S.;
Thomas, J.P.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
ACS Nano
2018
|
Journal article
EID:
2-s2.0-85052862658
Contributors:
Thomas, J.P.;
Rahman, M.A.;
Srivastava, S.;
Kang, J.-S.;
McGillivray, D.;
Abd-Ellah, M.;
Heinig, N.F.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
Thin Solid Films
2018
|
Journal article
EID:
2-s2.0-85051678024
Contributors:
Kadir, A.;
Srivastava, S.;
Li, Z.;
Lee, K.E.K.;
Sasangka, W.A.;
Gradecak, S.;
Chua, S.J.;
Fitzgerald, E.A.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
Nanoscale
2017
|
Journal article
EID:
2-s2.0-85030634535
Contributors:
Srivastava, S.;
Thomas, J.P.;
Heinig, N.;
Abd-Ellah, M.;
Rahman, M.A.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
ACS Applied Materials and Interfaces
2017
|
Journal article
EID:
2-s2.0-85032944695
Contributors:
Srivastava, S.;
Thomas, J.P.;
Heinig, N.F.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
Nanoscale
2016
|
Journal article
EID:
2-s2.0-84954090716
Contributors:
Abd-Ellah, M.;
Moghimi, N.;
Zhang, L.;
Thomas, J.P.;
McGillivray, D.;
Srivastava, S.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
Energy and Environmental Science
2015
|
Journal article
EID:
2-s2.0-84946143360
Contributors:
Rahman, M.A.;
Bazargan, S.;
Srivastava, S.;
Wang, X.;
Abd-Ellah, M.;
Thomas, J.P.;
Heinig, N.F.;
Pradhan, D.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
Advanced Electronic Materials
2015
|
Journal article
EID:
2-s2.0-84977136497
Contributors:
Abd-Ellah, M.;
Bazargan, S.;
Thomas, J.P.;
Rahman, M.A.;
Srivastava, S.;
Wang, X.;
Heinig, N.F.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
ACS Applied Materials and Interfaces
2015
|
Journal article
EID:
2-s2.0-84927922507
Contributors:
Thomas, J.P.;
Srivastava, S.;
Zhao, L.;
Abd-Ellah, M.;
McGillivray, D.;
Kang, J.S.;
Rahman, M.A.;
Moghimi, N.;
Heinig, N.F.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
Journal of Materials Chemistry C
2014
|
Journal article
EID:
2-s2.0-84904548494
Contributors:
Moghimi, N.;
Rahsepar, F.R.;
Srivastava, S.;
Heinig, N.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier
ACS Nano
2014
|
Journal article
EID:
2-s2.0-84912572828
Contributors:
Srivastava, S.;
Thomas, J.P.;
Rahman, Md.A.;
Abd-Ellah, M.;
Mohapatra, M.;
Pradhan, D.;
Heinig, N.F.;
Leung, K.T.
Source:
Saurabh Srivastava
via
Scopus - Elsevier