Personal information

Activities

Employment (4)

Institute of Materials Research and Engineering: Singapore, SG

2022-07 to present | Sr. Scientist (Advanced Optical Technology)
Employment
Source: Self-asserted source
Saurabh Srivastava

Applied Materials - NUS Advanced Materials Corporate Lab: Singapore, SG

2022-02 to 2022-07 | Research Fellow (Materials Science and Engineering)
Employment
Source: Self-asserted source
Saurabh Srivastava

Singapore-MIT Alliance for Research and Technology: Singapore, SG

2017-03 to 2021-12 | Sr. Postdoctoral Associate (Low Energy Electronic Systems)
Employment
Source: Self-asserted source
Saurabh Srivastava

University of Waterloo: Waterloo, Ontario, CA

2016-06 to 2017-03 | Postdoctoral Associate (Chemistry (Nanotechnology))
Employment
Source: Self-asserted source
Saurabh Srivastava

Education and qualifications (2)

University of Waterloo: Waterloo, ON, CA

2011-09 to 2016-05 | Ph.D. (Chemistry (Nanotechnology))
Education
Source: Self-asserted source
Saurabh Srivastava

Indian Institute of Technology Kharagpur: Kharagpur, West Bengal, IN

2009-07 to 2011-06 | Master of Technology (Materials Science and Engineering)
Education
Source: Self-asserted source
Saurabh Srivastava

Works (14)

Freestanding High-Resolution Quantum Dot Color Converters with Small Pixel Sizes

ACS Applied Materials & Interfaces
2022-11-02 | Journal article
Contributors: Saurabh Srivastava; Kenneth E. Lee; Eugene A. Fitzgerald; Stephen J. Pennycook; Silvija Gradečak
Source: check_circle
Crossref

Induced Complementary Resistive Switching in Forming-Free TiO<sub>x</sub>/TiO<sub>2</sub>/TiO<sub>x</sub>Memristors

ACS Applied Materials and Interfaces
2021 | Journal article
EID:

2-s2.0-85115100386

Part of ISSN: 19448252 19448244
Contributors: Srivastava, S.; Thomas, J.P.; Guan, X.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Defect-Rich Dopant-Free ZrO<sub>2</sub>Nanoclusters and Their Size-Dependent Ferromagnetism

ACS Applied Materials and Interfaces
2020 | Journal article
EID:

2-s2.0-85094931067

Part of ISSN: 19448252 19448244
Contributors: Guan, X.; Srivastava, S.; Thomas, J.P.; Heinig, N.F.; Kang, J.-S.; Rahman, M.A.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Programmable, electroforming-free TiO<sub>: X</sub>/TaO<sub>x</sub> heterojunction-based non-volatile memory devices

Nanoscale
2019 | Journal article
EID:

2-s2.0-85073125882

Part of ISSN: 20403372 20403364
Contributors: Srivastava, S.; Thomas, J.P.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Highly Conducting Hybrid Silver-Nanowire-Embedded Poly(3,4-ethylenedioxythiophene):Poly(styrenesulfonate) for High-Efficiency Planar Silicon/Organic Heterojunction Solar Cells

ACS Nano
2018 | Journal article
EID:

2-s2.0-85052862658

Part of ISSN: 1936086X 19360851
Contributors: Thomas, J.P.; Rahman, M.A.; Srivastava, S.; Kang, J.-S.; McGillivray, D.; Abd-Ellah, M.; Heinig, N.F.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Influence of substrate nitridation on the threading dislocation density of GaN grown on 200 mm Si (111) substrate

Thin Solid Films
2018 | Journal article
EID:

2-s2.0-85051678024

Part of ISSN: 00406090
Contributors: Kadir, A.; Srivastava, S.; Li, Z.; Lee, K.E.K.; Sasangka, W.A.; Gradecak, S.; Chua, S.J.; Fitzgerald, E.A.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Efficient photoelectrochemical water splitting on ultrasmall defect-rich TaO<sub>:X</sub> nanoclusters enhanced by size-selected Pt nanocluster promoters

Nanoscale
2017 | Journal article
EID:

2-s2.0-85030634535

Part of ISSN: 20403372 20403364
Contributors: Srivastava, S.; Thomas, J.P.; Heinig, N.; Abd-Ellah, M.; Rahman, M.A.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

High-Performance Single-Active-Layer Memristor Based on an Ultrananocrystalline Oxygen-Deficient TiO<sub>x</sub> Film

ACS Applied Materials and Interfaces
2017 | Journal article
EID:

2-s2.0-85032944695

Part of ISSN: 19448252 19448244
Contributors: Srivastava, S.; Thomas, J.P.; Heinig, N.F.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Plasmonic gold nanoparticles for ZnO-nanotube photoanodes in dye-sensitized solar cell application

Nanoscale
2016 | Journal article
EID:

2-s2.0-84954090716

Part of ISSN: 20403372 20403364
Contributors: Abd-Ellah, M.; Moghimi, N.; Zhang, L.; Thomas, J.P.; McGillivray, D.; Srivastava, S.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Defect-rich decorated TiO<sub>2</sub> nanowires for super-efficient photoelectrochemical water splitting driven by visible light

Energy and Environmental Science
2015 | Journal article
EID:

2-s2.0-84946143360

Part of ISSN: 17545706 17545692
Contributors: Rahman, M.A.; Bazargan, S.; Srivastava, S.; Wang, X.; Abd-Ellah, M.; Thomas, J.P.; Heinig, N.F.; Pradhan, D.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Hierarchical Tin Oxide Nanostructures for Dye-Sensitized Solar Cell Application

Advanced Electronic Materials
2015 | Journal article
EID:

2-s2.0-84977136497

Part of ISSN: 2199160X
Contributors: Abd-Ellah, M.; Bazargan, S.; Thomas, J.P.; Rahman, M.A.; Srivastava, S.; Wang, X.; Heinig, N.F.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Reversible structural transformation and enhanced performance of PEDOT:PSS-based hybrid solar cells driven by light intensity

ACS Applied Materials and Interfaces
2015 | Journal article
EID:

2-s2.0-84927922507

Part of ISSN: 19448252 19448244
Contributors: Thomas, J.P.; Srivastava, S.; Zhao, L.; Abd-Ellah, M.; McGillivray, D.; Kang, J.S.; Rahman, M.A.; Moghimi, N.; Heinig, N.F.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Shape-dependent magnetism of bimetallic FeNi nanosystems

Journal of Materials Chemistry C
2014 | Journal article
EID:

2-s2.0-84904548494

Part of ISSN: 20507526 20507534
Contributors: Moghimi, N.; Rahsepar, F.R.; Srivastava, S.; Heinig, N.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Size-selected TiO<sub>2</sub> nanocluster catalysts for efficient photoelectrochemical water splitting

ACS Nano
2014 | Journal article
EID:

2-s2.0-84912572828

Part of ISSN: 1936086X 19360851
Contributors: Srivastava, S.; Thomas, J.P.; Rahman, Md.A.; Abd-Ellah, M.; Mohapatra, M.; Pradhan, D.; Heinig, N.F.; Leung, K.T.
Source: Self-asserted source
Saurabh Srivastava via Scopus - Elsevier

Peer review (12 reviews for 5 publications/grants)

Review activity for Electronics. (3)
Review activity for Journal of electronic materials. (2)
Review activity for Journal of electronic materials. (2)
Review activity for Micromachines. (2)
Review activity for Nanomaterials. (3)