Personal information

Activities

Employment (3)

IHP GmbH - Innovations for High Performance Microelectronics: Frankfurt an der Oder, Brandenburg, DE

2021-08-01 to present | Research associate (Technology)
Employment
Source: Self-asserted source
Dirk Hagen

Max Planck Institute of Microstructure Physics: Halle, DE

2018-07-01 to 2021-04-30 | Postdoctoral researcher (NISE)
Employment
Source: Self-asserted source
Dirk Hagen

Aalto University: Espoo, FI

2015-06-12 to 2018-03-31 | Postdoctoral researcher (Chemistry and Materials Science)
Employment
Source: Self-asserted source
Dirk Hagen

Education and qualifications (2)

University College Cork National University of Ireland: Cork, IE

2010-01-01 to 2014 | PhD (Chemistry, Tyndall Mational Institute)
Education
Source: Self-asserted source
Dirk Hagen

Hochschule für angewandte Wissenschaften Coburg: Coburg, Bayern, DE

2004-09-01 to 2009 | Diplom (FH) (Physicalische Technik / Engineering Physics)
Education
Source: Self-asserted source
Dirk Hagen

Works (15)

Atomic Layer Deposition of the Conductive Delafossite PtCoO2

Advanced Materials Interfaces
2022-04 | Journal article
Contributors: Dirk J. Hagen; Jiho Yoon; Haojie Zhang; Bodo Kalkofen; Mindaugas Silinskas; Felix Börrnert; Hyeon Han; Stuart S. P. Parkin
Source: check_circle
Crossref

Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting

Angewandte Chemie International Edition
2020-09-21 | Journal article
Contributors: Haojie Zhang; Dirk J. Hagen; Xiaopeng Li; Andreas Graff; Frank Heyroth; Bodo Fuhrmann; Ilya Kostanovskiy; Stefan L. Schweizer; Francesco Caddeo; A. Wouter Maijenburg et al.
Source: check_circle
Crossref

Die Atomlagenabscheidung von Cobaltphosphid zum Zwecke einer effizienten Wasserspaltung

Angewandte Chemie
2020-09-21 | Journal article
Contributors: Haojie Zhang; Dirk J. Hagen; Xiaopeng Li; Andreas Graff; Frank Heyroth; Bodo Fuhrmann; Ilya Kostanovskiy; Stefan L. Schweizer; Francesco Caddeo; A. Wouter Maijenburg et al.
Source: check_circle
Crossref

Atomic layer deposition of thermoelectric layered cobalt oxides

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
2020-05-01 | Journal article
Contributors: Dirk J. Hagen; Maarit Karppinen
Source: check_circle
Crossref

Atomic layer deposition of metals: Precursors and film growth

Applied Physics Reviews
2019-12 | Journal article
Contributors: D. J. Hagen; M. E. Pemble; M. Karppinen
Source: check_circle
Crossref

Atomic/molecular layer deposition of Cu–organic thin films

Dalton Transactions
2018 | Journal article
Contributors: D. J. Hagen; L. Mai; A. Devi; J. Sainio; M. Karppinen
Source: check_circle
Crossref

Microstructure and optical properties of ultra-thin NiO films grown by atomic layer deposition

Semiconductor Science and Technology
2018-11-01 | Journal article
Part of ISSN: 0268-1242
Part of ISSN: 1361-6641
Source: Self-asserted source
Dirk Hagen

Atomic layer deposition of nickel–cobalt spinel thin films

Dalton Transactions
2017 | Journal article
Part of ISSN: 1477-9226
Part of ISSN: 1477-9234
Source: Self-asserted source
Dirk Hagen

Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD

Advanced Materials Interfaces
2017-09 | Journal article
Part of ISSN: 2196-7350
Source: Self-asserted source
Dirk Hagen

Luminescent Metal-Nucleobase Network Thin Films by Atomic/Molecular Layer Deposition

The Journal of Physical Chemistry C
2017-08-17 | Journal article
Part of ISSN: 1932-7447
Part of ISSN: 1932-7455
Source: Self-asserted source
Dirk Hagen

Low-temperature atomic layer deposition of crystalline manganese oxide thin films

Dalton Transactions
2016 | Journal article
Part of ISSN: 1477-9226
Part of ISSN: 1477-9234
Source: Self-asserted source
Dirk Hagen

Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper

Dalton Transactions
2015 | Journal article
Part of ISSN: 1477-9226
Part of ISSN: 1477-9234
Source: Self-asserted source
Dirk Hagen

Atomic Layer Deposition on Fabrics for Flame Resistance

ECS Transactions
2015-08-05 | Journal article
Part of ISSN: 1938-6737
Part of ISSN: 1938-5862
Source: Self-asserted source
Dirk Hagen

Atomic layer deposition of Cu with a carbene-stabilized Cu(i) silylamide

J. Mater. Chem. C
2014 | Journal article
Part of ISSN: 2050-7526
Part of ISSN: 2050-7534
Source: Self-asserted source
Dirk Hagen

Plasma enhanced atomic layer deposition of copper: A comparison of precursors

Surface and Coatings Technology
2013-09 | Journal article
Part of ISSN: 0257-8972
Source: Self-asserted source
Dirk Hagen

Peer review (8 reviews for 1 publication/grant)

Review activity for Journal of vacuum science & technology. (8)