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Scopus Author ID: 57207983941

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Works (13)

On relationships between gas-phase and heterogeneous process kinetics in CF4 + H2 + Ar plasma

Vacuum
2025-04 | Journal article
DOI: 10.1016/j.vacuum.2025.114044
Contributors: Andrey Miakonkikh; Vitaly Kuzmenko; Alexander Efremov; Konstantin Rudenko
Source: check_circle
Crossref

Revealing the controlling mechanisms of atomic layer etching for high-k dielectrics in conventional inductively coupled plasma etching tool

Journal of Vacuum Science & Technology A
2024-09-01 | Journal article
DOI: 10.1116/6.0003717
Contributors: Vitaly Kuzmenko; Alexander Melnikov; Alexandr Isaev; Andrey Miakonkikh
Source: check_circle
Crossref

Formation of Black Silicon in a Process of Plasma Etching with Passivation in a SF6/O2 Gas Mixture

Nanomaterials
2024-05-28 | Journal article
DOI: 10.3390/nano14110945
Contributors: Andrey Miakonkikh; Vitaly Kuzmenko
Source: check_circle
Crossref
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Selective atomic layer etching of Al2O3, AlNx and HfO2 in conventional ICP etching tool

Vacuum
2023-01 | Journal article
DOI: 10.1016/j.vacuum.2022.111585
Contributors: V. Kuzmenko; Y. Lebedinskij; A. Miakonkikh; K. Rudenko
Source: check_circle
Crossref

A comparison of CF4, CBrF3 and C2Br2F4 plasmas: Physical parameters and densities of atomic species

Vacuum
2022-06 | Journal article
DOI: 10.1016/j.vacuum.2022.110991
Contributors: Andrey Miakonkikh; Vitaly Kuzmenko; Alexander Efremov; Konstantin Rudenko
Source: check_circle
Crossref

Application of Langmuir probe and optical emission spectroscopy for bromofluorocarbon plasma diagnostics

Journal of Physics: Conference Series
2021 | Conference paper
DOI: 10.1088/1742-6596/1870/1/012006
EID:

2-s2.0-85104860001

Part of ISSN: 17426596 17426588
Contributors: Kuzmenko, V.; Miakonkikh, A.; Rudenko, K.
Source: Self-asserted source
Vitaly Kuzmenko via Scopus - Elsevier

Low-Pressure Inductively Coupled CF<sub>3</sub>Br Plasma Studied by the Langmuir Probe and Optical Emission Spectroscopy Techniques

Technical Physics Letters
2021 | Journal article
DOI: 10.1134/S1063785021010247
EID:

2-s2.0-85101825955

Part of ISSN: 10906533 10637850
Contributors: Kuzmenko, V.O.; Miakonkikh, A.V.
Source: Self-asserted source
Vitaly Kuzmenko via Scopus - Elsevier

Optimization of deep silicon etching process for microstructures fabrication

Journal of Physics: Conference Series
2021 | Conference paper
DOI: 10.1088/1742-6596/2086/1/012190
EID:

2-s2.0-85122340805

Part of ISSN: 17426596 17426588
Contributors: Kuzmenko, V.; Miakonkikh, A.; Rudenko, K.
Source: Self-asserted source
Vitaly Kuzmenko via Scopus - Elsevier

Study of the Plasma Resistance of a High Resolution e-Beam Resist HSQ for Prototyping Nanoelectronic Devices

Russian Microelectronics
2021 | Journal article
DOI: 10.1134/S1063739721050048
EID:

2-s2.0-85114674246

Part of ISSN: 16083415 10637397
Contributors: Miakonkikh, A.V.; Shishlyannikov, A.V.; Tatarintsev, A.A.; Kuzmenko, V.O.; Rudenko, K.V.; Gornev, E.S.
Source: Self-asserted source
Vitaly Kuzmenko via Scopus - Elsevier

Atomic layer etching of Silicon Oxide

Journal of Physics: Conference Series
2019 | Conference paper
DOI: 10.1088/1742-6596/1410/1/012023
EID:

2-s2.0-85078196835

Part of ISSN: 17426596 17426588
Contributors: Kuzmenko, V.; Miakonkikh, A.; Rudenko, K.
Source: Self-asserted source
Vitaly Kuzmenko via Scopus - Elsevier

Cyclic discrete etching of Silicon oxide in deposition-sputtering cycles: Towards to ALE

Proceedings of SPIE - The International Society for Optical Engineering
2019 | Conference paper
DOI: 10.1117/12.2522472
EID:

2-s2.0-85063543613

Part of ISSN: 1996756X 0277786X
Contributors: Kuzmenko, V.; Miakonkikh, A.; Rudenko, K.
Source: Self-asserted source
Vitaly Kuzmenko via Scopus - Elsevier

Influence of the electromigration on the characteristics of electrochemical microsystems

Proceedings of SPIE - The International Society for Optical Engineering
2019 | Conference paper
DOI: 10.1117/12.2521976
EID:

2-s2.0-85063487229

Part of ISSN: 1996756X 0277786X
Contributors: Zhevnenko, D.A.; Gornev, E.S.; Kuzmenko, V.O.; Dudkin, P.V.; Zhabin, S.N.; Krishtop, T.V.; Krishtop, V.G.
Source: Self-asserted source
Vitaly Kuzmenko via Scopus - Elsevier

Study of synergy phenomena for atomic layer etching of aluminum and hafnium oxides

Proceedings of SPIE - The International Society for Optical Engineering
2019 | Conference paper
DOI: 10.1117/12.2522473
EID:

2-s2.0-85063469451

Part of ISSN: 1996756X 0277786X
Contributors: Kuzmenko, V.; Miakonkikh, A.; Rudenko, K.
Source: Self-asserted source
Vitaly Kuzmenko via Scopus - Elsevier
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