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Works (14)

Industrial data-driven machine learning soft sensing for optimal operation of etching tools

Digital Chemical Engineering
2024-12 | Journal article
DOI: 10.1016/j.dche.2024.100195
Contributors: Feiyang Ou; Henrik Wang; Chao Zhang; Matthew Tom; Sthitie Bom; James F. Davis; Panagiotis D. Christofides
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Integrating run-to-run control with feedback control for a spatial atomic layer etching reactor

Chemical Engineering Research and Design
2024-03 | Journal article
DOI: 10.1016/j.cherd.2024.01.030
Contributors: Henrik Wang; Matthew Tom; Feiyang Ou; Gerassimos Orkoulas; Panagiotis D. Christofides
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Multiscale computational fluid dynamics modeling of an area-selective atomic layer deposition process using a discrete feed method

Digital Chemical Engineering
2024-03 | Journal article
DOI: 10.1016/j.dche.2024.100140
Contributors: Henrik Wang; Matthew Tom; Feiyang Ou; Gerassimos Orkoulas; Panagiotis D. Christofides
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Sparse identification modeling and predictive control of wafer temperature in an atomic layer etching reactor

Chemical Engineering Research and Design
2024-02 | Journal article
DOI: 10.1016/j.cherd.2023.12.024
Contributors: Feiyang Ou; Fahim Abdullah; Henrik Wang; Matthew Tom; Gerassimos Orkoulas; Panagiotis D. Christofides
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Machine Learning Modeling and Run-to-Run Control of an Area-Selective Atomic Layer Deposition Spatial Reactor

Coatings
2023-12-27 | Journal article
DOI: 10.3390/coatings14010038
Contributors: Matthew Tom; Henrik Wang; Feiyang Ou; Gerassimos Orkoulas; Panagiotis D. Christofides
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Computational fluid dynamics modeling of a discrete feed atomic layer deposition reactor: Application to reactor design and operation

Computers & Chemical Engineering
2023-10 | Journal article
DOI: 10.1016/j.compchemeng.2023.108400
Contributors: Matthew Tom; Henrik Wang; Feiyang Ou; Sungil Yun; Gerassimos Orkoulas; Panagiotis D. Christofides
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Multiscale CFD Modeling of Area-Selective Atomic Layer Deposition: Application to Reactor Design and Operating Condition Calculation

Coatings
2023-03-05 | Journal article
DOI: 10.3390/coatings13030558
Contributors: Sungil Yun; Henrik Wang; Matthew Tom; Feiyang Ou; Gerassimos Orkoulas; Panagiotis D. Christofides
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Quantifying transport and electrocatalytic reaction processes in a gastight rotating cylinder electrode reactor via integration of Computational Fluid Dynamics modeling and experiments

Electrochimica Acta
2023-02 | Journal article
DOI: 10.1016/j.electacta.2022.141698
Contributors: Derek Richard; Matthew Tom; Joonbaek Jang; Sungil Yun; Panagiotis D. Christofides; Carlos G. Morales-Guio
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Atomistic-mesoscopic modeling of area-selective thermal atomic layer deposition

Chemical Engineering Research and Design
2022-12 | Journal article
DOI: 10.1016/j.cherd.2022.09.051
Part of ISSN: 0263-8762
Contributors: Sungil Yun; Feiyang Ou; Henrik Wang; Matthew Tom; Gerassimos Orkoulas; Panagiotis D. Christofides
Source: Self-asserted source
Matthew Tom

Machine learning-based run-to-run control of a spatial thermal atomic layer etching reactor

Computers & Chemical Engineering
2022-12 | Journal article
DOI: 10.1016/j.compchemeng.2022.108044
Contributors: Matthew Tom; Sungil Yun; Henrik Wang; Feiyang Ou; Gerassimos Orkoulas; Panagiotis D. Christofides
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Multiscale computational fluid dynamics modeling of spatial thermal atomic layer etching

Computers & Chemical Engineering
2022-07 | Journal article
DOI: 10.1016/j.compchemeng.2022.107861
Contributors: Sungil Yun; Matthew Tom; Gerassimos Orkoulas; Panagiotis D. Christofides
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Multivariable run-to-run control of thermal atomic layer etching of aluminum oxide thin films

Chemical Engineering Research and Design
2022-06 | Journal article
DOI: 10.1016/j.cherd.2022.03.039
Part of ISSN: 0263-8762
Contributors: Sungil Yun; Matthew Tom; Feiyang Ou; Gerassimos Orkoulas; Panagiotis D. Christofides
Source: Self-asserted source
Matthew Tom

Multiscale computational fluid dynamics modeling of thermal atomic layer etching: Application to chamber configuration design

Computers & Chemical Engineering
2022-05 | Journal article
DOI: 10.1016/j.compchemeng.2022.107757
Contributors: Sungil Yun; Matthew Tom; Feiyang Ou; Gerassimos Orkoulas; Panagiotis D. Christofides
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Microscopic and data-driven modeling and operation of thermal atomic layer etching of aluminum oxide thin films

Chemical Engineering Research and Design
2022-01 | Journal article
DOI: 10.1016/j.cherd.2021.10.016
Part of ISSN: 0263-8762
Contributors: Sungil Yun; Matthew Tom; Junwei Luo; Gerassimos Orkoulas; Panagiotis D. Christofides; Matthew Tom
Source: Self-asserted source
Matthew Tom
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