Personal information
Biography
Satomi Tajima received her Ph.D. from the Department of Mechanical Engineering at the University of California at Berkeley in 2006. She then spent two years at General Electric Co. as a systems engineer and three years at the University of Tokyo as a project researcher. She joined Nagoya University in 2012 as a project Associate Professor. Her research interests are chemical dry etching of Si related materials for power devices, and the plasma-induced surface modification of various materials for aerospace, automotive, and healthcare applications for the adhesion improvement. She has been an executive committee of International Symposium on Dry Process (DPS), International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials / International Conference on Plasma-Nano Technology & Science (IS-Plasma/IC-PLANTS) since 2012. Her chemical dry etching team awarded the “Six main (distinguished) results supported by Nanotechnology Platform Japan, 2012” from the Ministry of Education, Culture, Sports, Science and Technology-Japan of presenting the effect of the substrate temperature during the Si chemical dry etching in NO and F2 gases.
Her hobbies are photography, gardening, birdwatching, and cooking.
Activities
Employment (5)
Education and qualifications (1)
Funding (2)
Works (19)
10.1021/jp4084794
2-s2.0-84885587260
10.1021/jp3119132
2-s2.0-84875132641
10.1016/j.tsf.2011.01.219
2-s2.0-80051550495
10.2494/photopolymer.23.555
2-s2.0-77957221610
10.1063/1.3499272
2-s2.0-78149453134
10.1002/jbm.a.31539
10.1063/1.2402033
10.1021/jp067521e
10.1088/0022-3727/39/6/014
10.1063/1.2338635
10.1021/jp052121x
10.1116/1.1361036
10.1016/s0921-5093(00)01217-x