Personal information

Emails & domains

Verified email addresses

Verified email domains

Other IDs

Scopus Author ID: 53264867000
ResearcherID: E-7768-2017

Activities

Collapse all

Employment (2)

Toyota Technological Institute: Nagoya, JP

2017 to 2018 | Postdoctoral Researcher
Employment
Source: Self-asserted source
Teuku Muhammad Roffi

The University of Electro-Communications: Tokyo, JP

2016 to 2017 | Postdoctoral Researcher
Employment
Source: Self-asserted source
Teuku Muhammad Roffi

Education and qualifications (1)

The University of Electro-Communications: Tokyo, JP

2013 to 2016 | Ph.D. (Engineering Science-Electronic Engineering)
Education
Source: Self-asserted source
Teuku Muhammad Roffi

Works (11)

Internet of things based automated monitoring for indoor aeroponic system

International Journal of Electrical and Computer Engineering (IJECE)
2023-02-01 | Journal article
DOI: 10.11591/ijece.v13i1.pp270-277
Contributors: Teuku Muhammad Roffi; Charisma Aulia Jamhari
Source: check_circle
Crossref

Effects of Ionic Liquid, 1-Ethyl-3-methylimidazolium Chloride ([EMIM]Cl), on the Material and Electrical Characteristics of Asphaltene Thin Films

Materials
2022-04 | Journal article | Author
DOI: 10.3390/ma15082818
Contributors: Sundarajoo Thulasiraman; Noor Mona Md Yunus; Pradeep Kumar; Zayyan Rafi Kesuma; Nadia Norhakim; Cecilia Devi Wilfred; Teuku Muhammad Roffi; Mohamad Faizal Hamdan; Zainal Burhanudin
Source: check_circle
Multidisciplinary Digital Publishing Institute
grade
Preferred source (of 3)‎

Design and Implementation of IoT System for Aeroponic Chamber Temperature Monitoring

Proceeding - 2020 3rd International Conference on Vocational Education and Electrical Engineering: Strengthening the framework of Society 5.0 through Innovations in Education, Electrical, Engineering and Informatics Engineering, ICVEE 2020
2020 | Conference paper
DOI: 10.1109/ICVEE50212.2020.9243213
EID:

2-s2.0-85096661552
Contributors: Jamhari, C.A.; Wibowo, W.K.; Annisa, A.R.; Roffi, T.M.
Source: Self-asserted source
Teuku Muhammad Roffi via Scopus - Elsevier
grade
Preferred source (of 2)‎

Effects of Precursor Concentration on the Transparency of Hydrothermally Grown Zinc Oxide

Proceeding - 2020 3rd International Conference on Vocational Education and Electrical Engineering: Strengthening the framework of Society 5.0 through Innovations in Education, Electrical, Engineering and Informatics Engineering, ICVEE 2020
2020 | Conference paper
DOI: 10.1109/ICVEE50212.2020.9243249
EID:

2-s2.0-85096672342
Contributors: Kesuma, Z.R.; Agustina, K.; Wibowo, A.D.B.; Nugroho, T.A.; Roffi, T.M.
Source: Self-asserted source
Teuku Muhammad Roffi via Scopus - Elsevier
grade
Preferred source (of 2)‎

Hydrothermal Growth Temperature Dependence of Nanostructured Nickel Oxide Transparency

Proceeding - 2020 3rd International Conference on Vocational Education and Electrical Engineering: Strengthening the framework of Society 5.0 through Innovations in Education, Electrical, Engineering and Informatics Engineering, ICVEE 2020
2020 | Conference paper
DOI: 10.1109/ICVEE50212.2020.9243170
EID:

2-s2.0-85096702829
Contributors: Roffi, T.M.; Yansyah, F.R.; Ramadhan, A.W.; Karim, R.N.; Pertiwi, N.I.
Source: Self-asserted source
Teuku Muhammad Roffi via Scopus - Elsevier
grade
Preferred source (of 2)‎

Laser-induced local activation of Mg-doped GaN with a high lateral resolution for high power vertical devices

AIP Advances
2018 | Journal article
DOI: 10.1063/1.5009970
EID:

2-s2.0-85041444573
Contributors: Kurose, N.; Matsumoto, K.; Yamada, F.; Roffi, T.M.; Kamiya, I.; Iwata, N.; Aoyagi, Y.
Source: Self-asserted source
Teuku Muhammad Roffi via Scopus - Elsevier
grade
Preferred source (of 2)‎

Growth mechanism of single-crystalline NiO thin films grown by metal organic chemical vapor deposition

Journal of Crystal Growth
2016 | Journal article
DOI: 10.1016/j.jcrysgro.2016.06.047
EID:

2-s2.0-84978275810
Contributors: Roffi, T.M.; Nozaki, S.; Uchida, K.
Source: Self-asserted source
Teuku Muhammad Roffi via Scopus - Elsevier
grade
Preferred source (of 2)‎

Structural, electrical, and optical properties of Co<inf>x</inf>Ni<inf>1-x</inf>O films grown by metalorganic chemical vapor deposition

Journal of Crystal Growth
2015 | Journal article
DOI: 10.1016/j.jcrysgro.2014.10.027
EID:

2-s2.0-84922485490
Contributors: Roffi, T.M.; Uchida, K.; Nozaki, S.
Source: Self-asserted source
Teuku Muhammad Roffi via Scopus - Elsevier
grade
Preferred source (of 2)‎

Effect of O<inf>2</inf>/Ni ratio on structure and surface morphology of atmospheric pressure MOCVD grown NiO thin films

Materials Research Society Symposium Proceedings
2013 | Conference paper
DOI: 10.1557/opl.2013.651
EID:

2-s2.0-84900336059
Contributors: Roffi, T.M.; Nakamura, M.; Uchida, K.; Nozaki, S.
Source: Self-asserted source
Teuku Muhammad Roffi via Scopus - Elsevier
grade
Preferred source (of 2)‎

Improvement of high-power-white-LED lamp performance by liquid injection

Proceedings of the 2011 International Conference on Electrical Engineering and Informatics, ICEEI 2011
2011 | Conference paper
DOI: 10.1109/ICEEI.2011.6021601
EID:

2-s2.0-80054038528
Contributors: Roffi, T.M.; Idris, I.; Uchida, K.; Nozaki, S.; Sugiyama, N.; Morisaki, H.; Soelami, F.X.N.
Source: Self-asserted source
Teuku Muhammad Roffi via Scopus - Elsevier
grade
Preferred source (of 2)‎

VLSI design of a high-throughput discrete cosine transform for image compression systems

Proceedings of the 2011 International Conference on Electrical Engineering and Informatics, ICEEI 2011
2011 | Conference paper
DOI: 10.1109/ICEEI.2011.6021587
EID:

2-s2.0-80054026279
Contributors: Pradini, A.; Roffi, T.M.; Dirza, R.; Adiono, T.
Source: Self-asserted source
Teuku Muhammad Roffi via Scopus - Elsevier
grade
Preferred source (of 2)‎

Peer review (15 reviews for 5 publications/grants)

Review activity for Chemické zvesti. (1)
Review activity for IEEE transactions on semiconductor manufacturing : (3)
Review activity for Journal of applied physics. (1)
Review activity for Physical chemistry chemical physics. (4)
Review activity for RSC advances (6)
How many people are using ORCID?