Personal information

Optics, X-Ray, EUV lithography, Ultra-fast Optics, Computational imaging, Optical metrology
United States, France

Activities

Employment (2)

Lawrence Berkeley National Laboratory: Berkeley, CA, US

2017-01-11 to present | Advanced X-ray Optics Project Scientist (ALS)
Employment
Source: Self-asserted source
Antoine Islegen-Wojdyla

Lawrence Berkeley National Laboratory: Berkeley, CA, US

2012 to 2016 | Postdoctoral fellow (MSD/CXRO)
Employment
Source: Self-asserted source
Antoine Islegen-Wojdyla

Education and qualifications (3)

Ecole Polytechnique: Palaiseau, Essone, FR

2008-09 to 2011-11 | Ph.D. (Physical sciences)
Education
Source: Self-asserted source
Antoine Islegen-Wojdyla

Aix-Marseille Université Faculte des Sciences: Marseille, Provence-Alpes-Côte d'Azur, FR

2007-09 to 2008-09 | Master in Optics and signal processing (Optics)
Education
Source: Self-asserted source
Antoine Islegen-Wojdyla

École Centrale Marseille: Marseille, Provence-Alpes-Côte d'Azur, FR

2005-09 to 2008-08 | Ingenieur
Education
Source: Self-asserted source
Antoine Islegen-Wojdyla

Works (38)

Exploring the use of x-ray adaptive optics in soft x-ray grating monochromators with wavefront propagation simulations

Advances in Computational Methods for X-Ray Optics VI
2023-10-05 | Conference paper
Contributors: Paola Luna; Antoine Wojdyla
Source: Self-asserted source
Antoine Islegen-Wojdyla

Latent Bayesian optimization for the autonomous alignment of synchrotron beamlines

Advances in Computational Methods for X-Ray Optics VI
2023-10-05 | Conference paper
Contributors: Thomas W. Morris; Yonghua Du; Mikhail Fedurin; Abigail C. Giles; Paul Moeller; Boaz Nash; Max . Rakitin; Brianna Romasky; Andrew L. Walter; Noah Wilson et al.
Source: Self-asserted source
Antoine Islegen-Wojdyla

X-ray wavefront sensor development at the Advanced Light Source

Advances in Metrology for X-Ray and EUV Optics X
2023-10-03 | Conference paper
Contributors: Kenneth A. Goldberg; Antoine Wojdyla; Diane Bryant; Xianbo Shi; Luca Rebuffi; Matthew Frith; Matthew Highland; Lahsen Assoufid; Yoshio Ichii; Takato Inoue et al.
Source: Self-asserted source
Antoine Islegen-Wojdyla

Guest Editorial

Synchrotron Radiation News
2023-09-03 | Journal article
Contributors: Antoine Wojdyla; Lucia Alianelli
Source: check_circle
Crossref

Real-time machine-learning-driven control system of a deformable mirror for achieving aberration-free X-ray wavefronts

Optics Express
2023-06-19 | Journal article
Contributors: Luca Rebuffi; Xianbo Shi; Zhi Qiao; Matthew J. Highland; Matthew G. Frith; Antoine Wojdyla; Kenneth A. Goldberg; Lahsen Assoufid
Source: check_circle
Crossref

Data-driven modeling and control of an X-ray bimorph adaptive mirror

Journal of Synchrotron Radiation
2023-01-01 | Journal article | Investigation
Part of ISSN: 1600-5775
Contributors: Gautam Gunjala; Antoine Wojdyla; Kenneth Goldberg; Zhi Qiao; Xianbo Shi; Lahsen Assoufid; Laura Waller; Antoine Islegen-Wojdyla
Source: Self-asserted source
Antoine Islegen-Wojdyla

Fabrication of low blaze angle gratings by replication and plasma etch

Advances in X-Ray/EUV Optics and Components XVII
2022-10-04 | Conference paper
Contributors: Sooyeon Park; Dmitriy L. Voronov; Antoine Wojdyla; Eric M. Gullikson; Fahard Salmassi; Howard A. Padmore
Source: Self-asserted source
Antoine Islegen-Wojdyla

Wavefront Preservation in Soft X-Ray Beamlines for the Advanced Light Source Upgrade

Synchrotron Radiation News
2021-11-02 | Magazine article
Part of ISSN: 0894-0886
Part of ISSN: 1931-7344
Contributors: Antoine Wojdyla; Kenneth A. Goldberg
Source: Self-asserted source
Antoine Islegen-Wojdyla

Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors

Sensors
2021-01-13 | Journal article
Contributors: Kenneth A. Goldberg; Antoine Wojdyla; Diane Bryant
Source: check_circle
Crossref

Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing

Optics Letters
2020-09-01 | Journal article
Contributors: Kenneth A. Goldberg; Diane Bryant; Antoine Wojdyla; Michael Helmbrecht; Eric Gullikson
Source: check_circle
Crossref

Extreme ultraviolet microscope characterization using photomask surface roughness

Scientific Reports
2020-07-15 | Journal article
Part of ISSN: 2045-2322
Source: Self-asserted source
Antoine Islegen-Wojdyla

Adaptive shape control of wavefront-preserving X-ray mirrors with active cooling and heating

Optics Express
2020-06-22 | Journal article
Part of ISSN: 1094-4087
Source: Self-asserted source
Antoine Islegen-Wojdyla

EUV photolithography mask inspection using Fourier ptychography

Image Sensing Technologies: Materials, Devices, Systems, and Applications V
2018-05-29 | Conference paper
Contributors: Antoine Wojdyla; Markus P. Benk; Patrick P. Naulleau; Kenneth A. Goldberg
Source: Self-asserted source
Antoine Islegen-Wojdyla

Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging

Applied Optics
2017 | Journal article
EID:

2-s2.0-85018505318

Contributors: Naulleau, P.P.; Benk, M.; Goldberg, K.A.; Gullikson, E.M.; Wojdyla, A.; Wang, Y.-G.; Neureuther, A.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks

Proceedings of SPIE - The International Society for Optical Engineering
2016 | Conference paper
EID:

2-s2.0-84981328137

Contributors: Wojdyla, A.; Donoghue, A.; Benk, M.P.; Naulleau, P.P.; Goldberg, K.A.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Emulation of anamorphic imaging on the SHARP EUV mask microscope

Proceedings of SPIE - The International Society for Optical Engineering
2016 | Conference paper
EID:

2-s2.0-84981306414

Contributors: Benk, M.P.; Wojdyla, A.; Chao, W.; Salmassi, F.; Oh, S.; Wang, Y.-G.; Miyakawa, R.H.; Naulleau, P.P.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

Journal of Micro/ Nanolithography, MEMS, and MOEMS
2016 | Journal article
EID:

2-s2.0-84978732279

Contributors: Benk, M.P.; Wojdyla, A.; Chao, W.; Salmassi, F.; Oh, S.; Wang, Y.-G.; Miyakawa, R.H.; Naulleau, P.P.; Goldberg, K.A.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Image-based pupil plane characterization via principal component analysis for EUVL tools

Proceedings of SPIE - The International Society for Optical Engineering
2016 | Conference paper
EID:

2-s2.0-84981297884

Contributors: Levinson, Z.; Burbine, A.; Verduijn, E.; Wood, O.; Mangat, P.; Goldberg, K.A.; Benk, M.P.; Wojdyla, A.; Smith, B.W.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Measurement of euv lithography pupil amplitude and phase variation via image-based methodology

Journal of Micro/ Nanolithography, MEMS, and MOEMS
2016 | Journal article
EID:

2-s2.0-84976636625

Contributors: Levinson, Z.; Verduijn, E.; Wood, O.R.; Mangat, P.; Goldberg, K.A.; Benk, M.P.; Wojdyla, A.; Smith, B.W.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Off-axis aberration estimation in an EUV microscope using natural speckle

Optics InfoBase Conference Papers
2016 | Conference paper
EID:

2-s2.0-85019529242

Contributors: Shanker, A.; Wojdyla, A.; Gunjala, G.; Dong, J.; Benk, M.; Neureuther, A.; Goldberg, K.; Waller, L.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask

Proceedings of SPIE - The International Society for Optical Engineering
2016 | Conference paper
EID:

2-s2.0-84989323181

Contributors: Naulleau, P.; Anderson, C.N.; Chao, W.; Goldberg, K.A.; Gullikson, E.; Salmassi, F.; Wojdyla, A.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

A method of image-based aberration metrology for EUVL tools

Proceedings of SPIE - The International Society for Optical Engineering
2015 | Conference paper
EID:

2-s2.0-84931362613

Contributors: Levinson, Z.; Raghunathan, S.; Verduijn, E.; Wood, O.; Mangat, P.; Goldberg, K.; Benk, M.; Wojdyla, A.; Philipsen, V.; Hendrickx, E. et al.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Aberration estimation using EUV mask roughness

Proceedings of SPIE - The International Society for Optical Engineering
2015 | Conference paper
EID:

2-s2.0-84931384632

Contributors: Claus, R.A.; Wojdyla, A.; Benk, M.P.; Goldberg, K.A.; Neureuther, A.R.; Naulleau, P.P.; Waller, L.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Broader view on extreme ultraviolet masks: Adding complementary imaging modes to the SHARP microscope

Journal of Micro/ Nanolithography, MEMS, and MOEMS
2015 | Journal article
EID:

2-s2.0-84923087109

Contributors: Benk, M.P.; Miyakawa, R.H.; Chao, W.; Wang, Y.-G.; Wojdyla, A.; Johnson, D.G.; Donoghue, A.P.; Goldberg, K.A.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
2015 | Journal article
EID:

2-s2.0-84940571085

Contributors: Benk, M.P.; Goldberg, K.A.; Wojdyla, A.; Anderson, C.N.; Salmassi, F.; Naulleau, P.P.; Kocsis, M.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Enabling euv resist research at the 1x and smaller regime

Journal of Photopolymer Science and Technology
2015 | Journal article
EID:

2-s2.0-84947289821

Contributors: Naulleau, P.; Anderson, C.; Chau, W.; Goldberg, K.; Wojdyla, A.; Bhattarai, S.; Neureuther, A.; Goodwin, F.; Neisser, M.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Enabling EUV resist research at the 1x and smaller regime

Journal of Photopolymer Science and Technology
2015 | Journal article
EID:

2-s2.0-84981215161

Contributors: Naulleau, P.; Anderson, C.; Chao, W.; Goldberg, K.; Wojdyla, A.; Bhattarai, S.; Neureuther, A.; Goodwin, F.; Neisser, M.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection

Proceedings of SPIE - The International Society for Optical Engineering
2015 | Conference paper
EID:

2-s2.0-84931458007

Contributors: Wang, Y.-G.; Miyakawa, R.; Chao, W.; Benk, M.; Wojdyla, A.; Donoghue, A.; Johnson, D.; Goldberg, K.; Neureuther, A.; Liang, T. et al.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

EUV actinic brightfield mask microscopy for predicting printed defect images

Proceedings of SPIE - The International Society for Optical Engineering
2015 | Conference paper
EID:

2-s2.0-84957927598

Contributors: Goldberg, K.; Benk, M.P.; Wojdyla, A.; Verduijn, E.; Wood, O.R.; Mangat, P.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Examination of phase retrieval algorithms for patterned EUV mask metrology

Proceedings of SPIE - The International Society for Optical Engineering
2015 | Conference paper
EID:

2-s2.0-84957868275

Contributors: Claus, R.A.; Wang, Y.-G.; Wojdyla, A.; Benk, M.P.; Goldberg, K.A.; Neureuther, A.R.; Naulleau, P.P.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging

Proceedings of SPIE - The International Society for Optical Engineering
2015 | Conference paper
EID:

2-s2.0-84939242048

Contributors: Mangat, P.; Verduijn, E.; Wood, O.R.; Benk, M.P.; Wojdyla, A.; Goldberg, K.A.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

New ways of looking at masks with the SHARP EUV microscope

Proceedings of SPIE - The International Society for Optical Engineering
2015 | Conference paper
EID:

2-s2.0-84931478096

Contributors: Goldberg, K.A.; Benk, M.P.; Wojdyla, A.; Johnson, D.G.; Donoghue, A.P.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Phase measurements of EUV mask defects

Proceedings of SPIE - The International Society for Optical Engineering
2015 | Conference paper
EID:

2-s2.0-84931406329

Contributors: Claus, R.A.; Wang, Y.-G.; Wojdyla, A.; Benk, M.P.; Goldberg, K.A.; Neureuther, A.R.; Naulleau, P.P.; Waller, L.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

A broader view on EUV-masks: Adding complementary imaging modes to the SHARP microscope

Proceedings of SPIE - The International Society for Optical Engineering
2014 | Conference paper
EID:

2-s2.0-84923012147

Contributors: Benk, M.P.; Miyakawa, R.H.; Chao, W.; Wang, Y.-G.; Wojdyla, A.; Johnson, D.G.; Donoghue, A.P.; Goldberg, K.A.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Actinic mask imaging: Recent results and future directions from the SHARP EUV microscope

Proceedings of SPIE - The International Society for Optical Engineering
2014 | Conference paper
EID:

2-s2.0-84902131585

Contributors: Goldberg, K.A.; Benk, M.P.; Wojdyla, A.; Mochi, I.; Rekawa, S.B.; Allezy, A.P.; Dickinson, M.R.; Cork, C.W.; Chao, W.; Zehm, D.J. et al.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Coded aperture detector: An image sensor with sub 20-nm pixel resolution

Optics Express
2014 | Journal article
EID:

2-s2.0-84906088498

Contributors: Miyakawa, R.; Mayer, R.; Wojdyla, A.; Vannier, N.; Lesser, I.; Aron-Dine, S.; Naulleau, P.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Ptychographic wavefront sensor for high-NA EUV inspection and exposure tools

Proceedings of SPIE - The International Society for Optical Engineering
2014 | Conference paper
EID:

2-s2.0-84902140269

Contributors: Wojdyla, A.; Miyakawa, R.; Naulleau, P.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Direct patterning of micro-optical structures by combined nanoimprinting and lithography

Proceedings of SPIE - The International Society for Optical Engineering
2008 | Conference paper
EID:

2-s2.0-45149085234

Contributors: Tuominen, J.; Hiltunen, J.; Wojdyla, A.; Karppinen, M.; Suutala, A.; Jantunen, H.; Bouffaron, R.; Escoubas, L.
Source: Self-asserted source
Antoine Islegen-Wojdyla via Scopus - Elsevier

Peer review (5 reviews for 4 publications/grants)

Review activity for Light, science & applications. (1)
Review activity for Nature (1)
Review activity for Nature photonics (1)
Review activity for Review of scientific instruments online. (2)